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Chemical Vapor Deposition

Thermal and Plasma Deposition of Electronic Materials

  • Book
  • © 1995

Overview

Authors:
  1. Srinivasan Sivaram
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Table of contents (11 chapters)

  1. Front Matter

    Pages i-xii
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  2. Introduction

    • Srinivasan Sivaram
    Pages 1-7

  3. Thin Film Phenomena

    • Srinivasan Sivaram
    Pages 8-40

  4. Manufacturability

    • Srinivasan Sivaram
    Pages 41-61

  5. Chemical Equilibrium and Kinetics

    • Srinivasan Sivaram
    Pages 62-93

  6. Reactor Design for Thermal CVD

    • Srinivasan Sivaram
    Pages 94-118

  7. Fundamentals of Plasma Chemistry

    • Srinivasan Sivaram
    Pages 119-143

  8. Processing Plasmas and Reactors

    • Srinivasan Sivaram
    Pages 144-162

  9. CVD of Conductors

    • Srinivasan Sivaram
    Pages 163-203

  10. CVD of Dielectrics

    • Srinivasan Sivaram
    Pages 204-226

  11. CVD of Semiconductors

    • Srinivasan Sivaram
    Pages 227-265

  12. Emerging CVD Techniques

    • Srinivasan Sivaram
    Pages 266-272

  13. Back Matter

    Pages 273-292
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About this book

In early 1987 I was attempting to develop a CVD-based tungsten process for Intel. At every step ofthe development, information that we were collecting had to be analyzed in light of theories and hypotheses from books and papers in many unrelated subjects. Thesesources were so widely different that I came to realize there was no unifying treatment of CVD and its subprocesses. More interestingly, my colleagues in the industry were from many disciplines (a surface chemist, a mechanical engineer, a geologist, and an electrical engineer werein my group). To help us understand the field of CVD and its players, some of us organized the CVD user's group of Northern California in 1988. The idea for writing a book on the subject occurred to me during that time. I had already organized my thoughts for a course I taught at San Jose State University. Later Van Nostrand agreed to publish my book as a text intended for students at the senior/first year graduate level and for process engineers in the microelectronics industry, This book is not intended to be bibliographical, and it does not cover every new material being studied for chemical vapor deposition. On the other hand, it does present the principles of CVD at a fundamental level while uniting them with the needs of the microelectronics industry.

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