Introduction

  • Srinivasan Sivaram

Abstract

Chemical vapor deposition (CVD) is a technique for synthesizing materials in which chemical components in vapor phase react to form a solid film at some surface. The occurrence of a chemical reaction is central to this means of thin film growth, as is the requirement that the reactants must start out in the vapor phase. Ability to control the components of the gas phase, and the physical conditions of the gas phase, the solid surface, and the envelope that surrounds them determines our capability to control the properties of the thin films that are produced.

Keywords

Chemical Vapor Deposition Film Property Dielectric Film Very Large Scale Integrate Chemical Vapor Deposition Process 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Reference

  1. 1.
    R. F. Bunshah, Deposition Technologies for Films and Coatings, Noyes, Park Ridge, N.J., 1982.Google Scholar

Copyright information

© Springer Science+Business Media New York 1995

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  • Srinivasan Sivaram

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