Abstract
The bulk of the discussion so far has concentrated on the two main modes of CVD film growth for microelectronics: thermal and plasma CVD. However, to suit novel applicatons, new CVD techniques are being developed where the energy for the forward progress of the CVD reaction is supplied by sources other than heat and electrical power. In these techniques, the reactant molecules are raised to excited states by direct absorption of energies from sources including photons, electrons and ions.
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Sivaram, S. (1995). Emerging CVD Techniques. In: Chemical Vapor Deposition. Springer, Boston, MA. https://doi.org/10.1007/978-1-4757-4751-5_11
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DOI: https://doi.org/10.1007/978-1-4757-4751-5_11
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