Design for Manufacturability with Advanced Lithography

  • Bei Yu
  • David Z. Pan

Table of contents

  1. Front Matter
    Pages i-xi
  2. Bei Yu, David Z. Pan
    Pages 1-6
  3. Bei Yu, David Z. Pan
    Pages 7-51
  4. Bei Yu, David Z. Pan
    Pages 53-82
  5. Bei Yu, David Z. Pan
    Pages 83-109
  6. Bei Yu, David Z. Pan
    Pages 111-157
  7. Bei Yu, David Z. Pan
    Pages 159-162
  8. Back Matter
    Pages 163-164

About this book

Introduction

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL).  The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography.  Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

  • Enables readers to tackle the challenge of layout decompositions for different patterning techniques;
  • Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design;
  • Includes coverage of the design for manufacturability with E-Beam lithography.

Keywords

Design for Manufacturability Design for Manufacturability and Yield Electron beam lithography Multiple patterning lithography Nano-CMOS Design for Manufacturability Triple Patterning Lithography

Authors and affiliations

  • Bei Yu
    • 1
  • David Z. Pan
    • 2
  1. 1.ECE DepartmentThe University of TexasAustinUSA
  2. 2.ECE DepartmentThe University of TexasAustinUSA

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-319-20385-0
  • Copyright Information Springer International Publishing Switzerland 2016
  • Publisher Name Springer, Cham
  • eBook Packages Engineering
  • Print ISBN 978-3-319-20384-3
  • Online ISBN 978-3-319-20385-0
  • About this book
Industry Sectors
Pharma
Automotive
Biotechnology
Electronics
Telecommunications
Energy, Utilities & Environment
Aerospace