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Nanoimprint Lithography: An Enabling Process for Nanofabrication

  • Weimin¬†Zhou

Table of contents

  1. Front Matter
    Pages i-xiii
  2. Weimin Zhou
    Pages 1-4
  3. Weimin Zhou
    Pages 33-74
  4. Weimin Zhou
    Pages 75-98
  5. Weimin Zhou
    Pages 99-110
  6. Weimin Zhou
    Pages 111-146
  7. Weimin Zhou
    Pages 147-160
  8. Weimin Zhou
    Pages 161-202
  9. Weimin Zhou
    Pages 203-216
  10. Weimin Zhou
    Pages 217-249
  11. Back Matter
    Pages 251-256

About this book

Introduction

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Keywords

Light Emitting Diodes Memory Devices Nanoimprint Lithography Solar Cell

Authors and affiliations

  • Weimin¬†Zhou
    • 1
  1. 1.Shanghai Nanotechnology Promotion CenterShanghaiChina, People's Republic

Bibliographic information

  • DOI https://doi.org/10.1007/978-3-642-34428-2
  • Copyright Information Springer-Verlag Berlin Heidelberg 2013
  • Publisher Name Springer, Berlin, Heidelberg
  • eBook Packages Engineering
  • Print ISBN 978-3-642-34427-5
  • Online ISBN 978-3-642-34428-2
  • Buy this book on publisher's site
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