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Principles and Status of Nanoimprint Lithography

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Nanoimprint Lithography: An Enabling Process for Nanofabrication

Abstract

Patterning technology is crucial in micro/nanofabrication. Development of photolithography roadmap is agreeable with Moore’s law, which claims that the number of transistors per square inch may double approximately every 18 months. However, due to exposure wavelength diffraction limit, the technical complexity and manufacturing costs have been increased dramatically for the nanometer-scale line-width manufacturing. In such a context, next-generation lithography (NGL) has been proposed to replace conventional photolithography.

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Authors and Affiliations

  1. Shanghai Nanotechnology Promotion Center, Shanghai, People’s Republic of China

    Weimin Zhou

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  1. Weimin Zhou
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Zhou, W. (2013). Principles and Status of Nanoimprint Lithography. In: Nanoimprint Lithography: An Enabling Process for Nanofabrication. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-34428-2_2

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  • DOI: https://doi.org/10.1007/978-3-642-34428-2_2

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  • Online ISBN: 978-3-642-34428-2

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