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Stamp Surface Treatment

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Nanoimprint Lithography: An Enabling Process for Nanofabrication

Abstract

Nanoimprint lithography is a simple process. In short, a substrate is coated with resin, and the stamp is pressed into the resin by mechanical deformation of imprint resist. The imprint resist is cured by heat or UV light during the imprinting process. Then, the mold is released from the substrate, referred to as demolding. Subsequent processes, such as plasma etching and lift-off, are applied for the pattern transferring [1]. The schematic of the nanoimprint lithography processes is given in Fig. 4.1.

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Authors and Affiliations

  1. Shanghai Nanotechnology Promotion Center, Shanghai, People’s Republic of China

    Weimin Zhou

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  1. Weimin Zhou
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Correspondence to Weimin Zhou .

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Zhou, W. (2013). Stamp Surface Treatment. In: Nanoimprint Lithography: An Enabling Process for Nanofabrication. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-34428-2_4

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  • DOI: https://doi.org/10.1007/978-3-642-34428-2_4

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-34427-5

  • Online ISBN: 978-3-642-34428-2

  • eBook Packages: EngineeringEngineering (R0)

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