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Nanofabrication

Principles, Capabilities and Limits

  • Book
  • © 2017
  • Latest edition

Overview

  • Compares nanofabrication technologies, including their capabilities and limitations, in a consistent, reader-friendly manner
  • Contains in-depth discussions on optical lithography and electron beam lithography, based on the author’s experience having developed simulation programs for each
  • Presents practical information and examples, drawn from both primary research and industrial applications, which readers can use in realistic situations and for trouble-shooting

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Table of contents (11 chapters)

Keywords

About this book

This second edition of Nanofabrication is one of the most comprehensive introductions on nanofabrication technologies and processes. A practical guide and reference, this book introduces readers to all of the developed technologies that are capable of making structures below 100nm. The principle of each technology is introduced and illustrated with minimum mathematics involved. Also analyzed are the capabilities of each technology in making sub-100nm structures, and the limits of preventing a technology from going further down the dimensional scale. This book provides readers with a toolkit that will help with any of their nanofabrication challenges.

Authors and Affiliations

  • Suzhou Institute of Nano-Tech and Nano-Nanobionics (SINANO), Suzhou, China

    Zheng Cui

About the author

Zheng Cui, PhD, is a professor at and Director of the Department of Printed Electronics at the Suzhou Institute of Nanotech and Nanobionics, Chinese Academy of Sciences. He received his PhD from Southeast University in Nanjing, China, and has been a Visiting Fellow at the Microelectronics Research Center at Cambridge University, as well as a Senior Scientist and Principal Scientist at Central Microstructure Facility in Rutherford Appleton Laboratory.

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