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Nanofabrication by Self-Assembly

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Nanofabrication

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Abstract

The nanofabrication technologies described in the previous chapters so far can be characterized as conventional technologies, in the sense that they always involve one way or another lithographic patterning and pattern transfer. They are still the same as, or not too much different from, the technologies for manufacturing integrated circuits, which originated nearly 55 years ago in 1961 when the first patent on planar integrated circuit was granted, though today’s technologies can make pattern structures a thousand times smaller. It is a “top-down” approach that complex structures are built up by patterning layers upon layers from the surface of a planar substrate. The capabilities of top-down nanofabrication technologies have been amply demonstrated in previous chapters. The smallest features which can be made by top-down approach are, however, always limited by the available fabrication tools, being either lithography or pattern transfer. On the other hand, nature has demonstrated its ability to produce extremely complex living organisms by self-organization and self-construction for billions of years, all of which are taking place at molecular level which is an order of magnitude smaller than a nanometer. One surely could ask the question why a desired nanostructure cannot be made by molecular self-assembly, which is a “bottom-up” approach where molecules autonomously “grow” into nanostructures.

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  1. Suzhou Institute of Nano-Tech and Nano-Nanobionics (SINANO), Suzhou, China

    Zheng Cui

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Cui, Z. (2017). Nanofabrication by Self-Assembly. In: Nanofabrication. Springer, Cham. https://doi.org/10.1007/978-3-319-39361-2_10

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  • DOI: https://doi.org/10.1007/978-3-319-39361-2_10

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