The Role of Interfacial Reactions in Determining Plasma–Liquid Chemistry Carly E. AndersonNico R. ChaDavid B. Graves Original Paper 23 August 2016 Pages: 1393 - 1415
Plasma Treated Sepiolite: A New Adsorbent for Removal of Malachite Green from Contaminated Water Mustafa KayaMehmet Fatih DilekoğluCafer Saka Original Paper 01 September 2016 Pages: 1417 - 1430
Molecular-Level Reinforced Adhesion Between Rubber and PTFE Film Treated by Atmospheric Plasma Polymerization Masaaki OkuboTakeshi OnjiMitsuru Tahara Original Paper 08 August 2016 Pages: 1431 - 1448
Plasma Chemical Functionalisation of a Cameroonian Kaolinite Clay for a Greater Hydrophilicity B. Sop TamoG. Kamgang-YoubiL. Tchadjie Original Paper 16 August 2016 Pages: 1449 - 1469
Synthesis of Mixed-Phase TiO2 Nanopowders Using Atmospheric Pressure Plasma Jet Driven by Dual-Frequency Power Sources Yong WangQianghua YuanShuyi Ma Original Paper 02 September 2016 Pages: 1471 - 1484
MnOx/TiO2 Catalysts for VOCs Abatement by Coupling Non-thermal Plasma and Photocatalysis I. AouadiJ.-M. TatibouëtL. Bergaoui Original Paper 13 August 2016 Pages: 1485 - 1499
Abatement of Gaseous Xylene Using Double Dielectric Barrier Discharge Plasma with In Situ UV Light: Operating Parameters and Byproduct Analysis Yao ShiZhenhua ShaoYi He Original Paper 22 August 2016 Pages: 1501 - 1515
Application of Flying Jet Plasma for Production of Biodiesel Fuel from Wasted Vegetable Oil Wameath S. Abdul-MajeedGhanim S. AAl-ThaniJamal N. Al-Sabahi Original Paper 19 July 2016 Pages: 1517 - 1531
Decomposition of Benzene Using a Pulse-Modulated DBD Plasma Tianpeng MaHuadong JiangFangchuan Zhong Original Paper 30 July 2016 Pages: 1533 - 1543
Simultaneous Removal of H2S and Dust in the Tail Gas by DC Corona Plasma Wang XueqianXu KeCheng Jinhuan Original Paper 16 September 2016 Pages: 1545 - 1558
Comparison of the Active Species in the RF and Microwave Flowing Discharges of N2 and Ar–20 %N2 André RicardJean-Philippe SarretteYu Kwon Kim Original Paper 08 August 2016 Pages: 1559 - 1570
Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr + Ar Inductively Coupled Plasmas Junmyung LeeAlexander EfremovKwang-Ho Kwon Original Paper 02 August 2016 Pages: 1571 - 1588
Effects of Pressure and Electrode Length on the Abatement of N2O and CF4 in a Low-Pressure Plasma Reactor M. HurJ. O. LeeY.-H. Song Original Paper 30 August 2016 Pages: 1589 - 1601