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The Simulation and Research of Etching Function Based on Scanning Electrochemical Microscopy

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Abstract

Scanning electrochemical microscopy (SECM) has already been employed as a micromachining method for a long time. However, coupling effects of some factors, including the voltage of the tool electrode, the distance between the tool electrode and substrates, tip current, and machining time on the machining process, have not been clearly stated. In this study, based on simulation and experimental results, an etching function between the etching depth and the above influencing factors in the machining process with SECM is proposed. First, the influence of the tool electrode, the distance between the tool electrode and substrates, tip current, and machining time on the etching depth was analyzed by a two-dimensional (2D) axisymmetric finite element model. Second, the etching function between these factors and the etching depth was established. Finally, this relationship was then simplified and verified by etching experiments. In summary, the etching function can be used to guide the etching process to machine 2D and 3D microstructures with SECM.

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Acknowledgements

The authors gratefully acknowledge financial support from the National Natural Science Foundation of China (21827802, 21573054, 21327002) and the Fundamental Research Funds for the Central Universities (20720190023).

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Authors and Affiliations

  1. State Key Laboratory of Micro-systems and Micro-structures Manufacturing of Ministry of Education, Harbin Institute of Technology, Harbin, 150001, Heilongjiang, People’s Republic of China

    Xiaole Wang, Yanquan Geng & Yongda Yan

  2. State Center for Precision Engineering, Harbin Institute of Technology, Harbin, 150001, Heilongjiang, People’s Republic of China

    Xiaole Wang, Yanquan Geng, Xuesen Zhao, Yongzhi Cao, Zhenjiang Hu & Yongda Yan

  3. State Key Laboratory of Physical Chemistry of Solid Surfaces (PCOSS), Collaborative Innovation Center of Chemistry for Energy Materials (iChem), Engineering Research Center of Electrochemical Technologies of Ministry of Education, and Department of Chemistry, College of Chemistry and Chemical Engineering, Xiamen University, Xiamen, 361005, People’s Republic of China

    Dongping Zhan

  4. Department of Mechanical and Electrical Engineering, School of Aerospace Engineering, Xiamen University, Xiamen, 361005, People’s Republic of China

    Lianhuan Han

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  1. Xiaole Wang
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  2. Lianhuan Han
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  3. Yanquan Geng
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  4. Xuesen Zhao
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  5. Yongzhi Cao
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  7. Dongping Zhan
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Correspondence to Yongda Yan.

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Wang, X., Han, L., Geng, Y. et al. The Simulation and Research of Etching Function Based on Scanning Electrochemical Microscopy. Nanomanuf Metrol 2, 160–167 (2019). https://doi.org/10.1007/s41871-019-00047-1

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  • DOI: https://doi.org/10.1007/s41871-019-00047-1

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