Abstract
Most CVD processes operate at some temperature other than that of the ambient. Sometimes only the sample is heated (“cold-wall reactors”); in other cases the whole process chamber (often a quartz or glass furnace tube) is heated to the process temperature (“hot-wall reactors”). Some processes operate at reduced temperatures (e.g. deposition of parylene from dimer precursors).
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Further Reading
Useful Texts
A Heat Transfer Textbook (2nd Edition), John Lienhard, Prentice–Hall 1981 (ISBN 0–13–385089–7)
Convection Heat Transfer, Adrian Bejan (2nd ed), Wiley 1995, ISBN 0–471–57972–6
Reactor Design
Heat transfer in a microelectronics plasma reactor” J. Daviet, L. Peccoud and F. Mondon J. Appl. Phys. 73 1471 (1993)
Low temperature etch chuck: Modeling and experimental results of heat transfer and wafer temperature” D. Wright, D. Hartman, U. Sridharan, M. Kent, T. Jasinski and S. Kang J. Vac. Sci. Technol. A10 1065 (1992)
Emissivity of silicon]: Ravindra et al IEEE Trans Sem Manfr vol. 11 p. 30 Feb 98
Temperature Measurement
Temperature Measurement during implantation at elevated temperatures (300–500°C) Peter Vandenabeele and Karen Maex, J Vac Sci Technol B9 2784 (1991)
Silicon Temperature Measurement by IR Absorbtion…“ J. Sturm and C. Reaves IEEE Tr El Dev 39 81 (1992)
Two-Wavelength Pyrometry with Self-Calibration“, Daniel Ng, NASA Lewis, NASA tech briefs (1998)
Resolution of Silicon Wafer Temperature Measurement by In Situ Ellipsometry in a Rapid Thermal Processor“ R. Sampson and H. Massoud, J. Electrochem. Soc. 140 2673 (1993)
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© 2003 Springer Science+Business Media Dordrecht
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Dobkin, D.M., Zuraw, M.K. (2003). Heat Transport. In: Principles of Chemical Vapor Deposition. Springer, Dordrecht. https://doi.org/10.1007/978-94-017-0369-7_4
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DOI: https://doi.org/10.1007/978-94-017-0369-7_4
Publisher Name: Springer, Dordrecht
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