Abstract
Chemical vapor deposition (CVD) performed in rapid thermal processing (RTP) chambers, also referred to as rapid thermal chemical vapor deposition (RTCVD), has been demonstrated for a wide range of typical microelectronics manufacturing processes [1], including growth of silicon [2], silicon oxide [3], and silicon nitride [4], as well as new processes, such as the growth of silicon germanium alloys [5]. These CVD systems share common features of gas-phase and surface reactions combined with fluid flow, heat transfer, and chemical species transport (cf. Figure 1).
This is a preview of subscription content, log in via an institution to check access.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
M. Moslehi, R. Chapman, M. Wong, A. Paranjpe, H. Najm, J. Kuehne, R. Yeakley, and C. Davis, IEEE Trans. Electron Devices 39, 4 (1992).
J.L. Regolini, D. Bensahel, and J. Mercier, J. Electron. Mater. 19, 1075 (1990).
X.L. Xu, R.T. Kuehn, J.J. Wortman, and M.C. Öztürk, Appl. Phys. Lett. 60, 3063 (1992).
K. Ando, H. Watanabe, and H. Ono in R. B. Fair and B. Lojek (Eds.), Proceedings of the Second International Conference on RTP, Monterey, CA 1994 p. 65.
M.L. Green, D. Brasen, H. Luftman and V.C. Kannan, J. Appl. Phys. 65, 2558 (1989).
C.R. Kleijn in M. Meyyappan, Computational Modeling in Semiconductor Processing (Artech House, Boston 1995) Ch. 4.
K.F. Jensen in M.L. Hitchman and K.F. Jensen, Chemical Vapor Deposition-Principles and Applications (Academic Press, London, 1993) Ch 2.
E.S. Oran and J.P. Boris, Prog. Energy Combust. Sci. 7, 1 (1981).
O.C. Zienkowitz, The Finite Element Method (McGraw Hill, New York, 1977).
H.B. Keller in P. Rabnowitz (Ed.), Applications of bifurcation theory (Academic Press, New York, 1977) p. 359.
M. Ikegawa and J. Kobayashi, J. Electrochem. Soc. 136, 2982 (1989).
T. Cale and G. Raupp, J. Vac. Sci. Technol. B 8, 1242 (1990).
D.G. Coronell and K.F. Jensen, J. Electrochem. Soc. 139, 2264 (1992);
D.G. Coronell and K.F. Jensen, J. Electrochem. Soc. 141, 2545 (1994);
D.G. Coronell and K.F. Jensen, J. Computer-Aided Mats. Design 1, 3–26 (1993).
R.B. Bird, W.E. Steward, and E.N. Lightfoot, Transport Phenomena, (Wiley, New York, 1960).
C.R. Kleijn, Th.H. van der Meer, and C.J. Hoogendoorn, J. Electrochem. Soc. 136, 3423 (1989).
J.O. Hirschfelder, C.F. Curtiss, and R.B. Bird, Molecular Theory of Gases and Liquids (J. Wiley & Sons, New York, 1954).
T.P. Coffee and J.M. Meimerl, Combust. Flame 43 273 (1981).
R.C. Reid, J.M. Prausnitz, and B.E. Poling, Properties of Gases and Liquids (McGraw-Hill, New York, 1987).
R.J. Kee, F.M. Rupley and J.A. Miller, The Chemkin Thermodynamic Data Base, Sandia Report SAND87–8215B (1991).
J. Bloem and L.J. Giling, Current Topics in Materials Science 1, 147 (1978).
P. Futerko and K.F. Jensen, J. Electrochemical Soc., submitted (1995).
J.W. Tilden, V. Costanza, G.J. McRae and J.H. Seinfeld in Modeling of Chemical Reaction Systems, edited by K.H. Ebert, P. Deuflhard and W. Juger (Springer-Verlag, Berlin, 1981) pp 6991.
H. Rabitz, Comput. Chem. 5, 167 (1981).
W. C. Gardiner Jr. (Ed.) Combustion Chemistry, (Springer-Verlag, Berlin, 1984).
M.E. Coltrin, R.J. Kee, and G.H. Evans, J. Electrochem. Soc. 136, 819 (1989).
M.E. Coltrin, R.J. Kee, and J.A. Miller, J. Electrochem. Soc. 131, 425 (1984);
M.E. Coltrin, R.J. Kee, and J.A. Miller, J. Electrochem. Soc. 133, 1206 (1986).
P. Ho and M.E. Coltrin, and W. G. Breiland, J. Phys. Chem. 98, 10138 (1994).
J.M. Jasinski, R. Debecerra, and R. Walsh, Chem. Rev. 95, 1203 (1995).
J.A. Dumesic, D.F. Rudd, L.M. Aparacio, J. Rekoske and A.A. Trevino, The Microkinetics Heterogeneous Catalysis, American Chemical Society, Washington, D.C. (1993).
W.G. Mallard, F. Westley, J.T. Hevron, R.F. Hampson and D.H. Frizzel, NIST Chemical Kinetics Database: Version 6.0, National Institute of Standards and Technology, Gaithersburg, MD (1994).
See, for example, K.J. Laidler, Chemical Kinetics, 3rd Ed., Harper and Row, New York (1987).
S.W. Benson, Thermochemical Kinetics, 2nd Ed., Wiley, New York, 1976.
W.J. Hehre, L. Radom, P.V.R. Schleyer and J.A. Pople, Ab Initio Molecular Orbital Theory, Wiley, New York, 1986.
J.J.P. Stewart, J. Comp. Chemistry 12 (1991) 320.
M.J. Frisch, G.W. Trucks, M. Head-Gordon, P.M.W. Gill, M.W. Wong, J.B. Foresman, B.G. Johnson, H.B. Schlegel, M.A. Robb, E.S. Replogle, R. Gomperts, J.L. Andres, K. Raghavachari, J.S. Binkley, C. Gonzalez, R.L. Martin, D.J. Fox, D.J. Defrees, J. Baker, J.J.P. Stewart and J.A. Pople, Gaussian 92, Gaussian Inc., Pittsburgh, 1992.
T. Ziegler, Chem. Rev. 91, 651 (1991).
J. Andzelm and E. Wimmer, J. Chem. Phys. 96 (1992) 1280.
P. Ho, M.E. Coltrin, J.S. Binkley, and C.F. Melius, J. Phys. Chem. 89, 4647 (1985);
P. Ho, M.E. Coltrin, J.S. Binkley, and C.F. Melius, J. Phys. Chem. 90, 3399 (1986).
C.L. Darling and H.B. Schlegel, J. Phys. Chem. 97, 8207 (1993).
M. Su and H.B. Schlegel, J. Phys. Chem. 97, 8732 (1993).
D. J. Lucas, L.A. Curtiss, and J.A. Pople, J. Chem. Phys. 99, 6697 (1993).
M.R. Zachariah and W. Tsang, J. Phys. Chem. 99, 5308 (1995).
D.G. Truhlar, A.D. Isaacson and B.C. Garrett in Theory of Chemical Reaction Dynamics Vol. 4, edited by M. Baer, (CRC Press, Boca Raton, Florida, 1985) pp. 65–137.
H.K. Moffat, K.F. Jensen, and R.W. Carr, J. Phys. Chem. 96, 7695 (1992).
R.G. Gilbert and S. C. Smith, Theory of Unimolecular and Recombination Reactions, Blackwell Scientific, Oxford, 1990.
P. R. Westmoreland, J. B. Howard, J. P. Longwell, and A. M. Dean, AIChE J. 32, 1971 (1986).
S. M. Gates, C. M. Greenlief, S. K. Kulkarni, and H. H. Sawin, J. Vac. Sci. Technol. A 8, 2965 (1990).
A. Goursot, I. Papai and D.R. Salahub, J. Am. Chem. Soc. 114, 7452 (1992).
D. Tomanek, Z. Sun and S.G. Louie, Phys. Rev. B 43, 4699 (1991).
M.A. Mendicino and E.G. Seebauer, J. Electrochem. Soc. 140, 1786 (1993).
Y.F. Wang and R. Pollard, J. Electrochem. Soc. 142, 1713 (1995).
B.S. Meyerson, IBM J. Res. Dev. 34, 806 (1990).
N.M. Russell and W.G. Breiland, J. Appl. Phys. 73, 3525 (1993).
C.G. Newman, J. Dzarnoski, M.A. Ring and H.E. O’Neal, Int. J. Chem. Kin. 12, 661 (1980).
V.N. Votintsev, I.S. Zaslonko, V.S. Mikheev and V.N. Smirnov, Kinetika y Kataliz 26, 1303 (1985).
M. Hierlemann, H. Simka, K.F. Jensen and M. Utz, J. Electrochem. Soc., submitted (1995).
R.C. Binning and L.A. Curtiss, J. Chem. Phys. 92, 1860 (1990).
R.C. Weast (Ed.), CRC Handbook of Physics and Chemistry, 73rd Ed., CRC Press, Boca Raton, Florida, 1993.
B. Ruscic, M. Schwarz and J. Berkowitz, J. Chem. Phys. 92, 1865 (1990).
P.N. Noble and R. Walsh, Int. J. Chem. Kinetics 15, 547 (1983).
B.S. Agrawala and D.W. Setser, J. Chem. Phys. 86, 5421 (1987).
K.L. Knutson, R.W. Carr, W.H. Liu and S.A. Campbell, J. Crystal Growth 140, 191 (1994).
M. Hierlemann, A. Kersch, C. Werner, and H. Schafer, J. Electrochem. Soc. 142, 259 (1995).
J.L. Regolini, D. Bensahel, J. Mercier and E. Scheid, J. Crystal Growth 96, 505 (1989).
P. D. Agnello, T. O. Sedgwick, and J. Cotte, J. Electrochem. Soc. 140, 2703 (1993).
D. D. Koleske, S. M. Gates, and D. B. Beach, J. Appl. Phys. 72, 4073 (1992).
N. Maity, L.Q. Xia, and J.R. Engstrom, Appl. Phys. Lett. 66, 1909 (1995).
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1996 Springer Science+Business Media Dordrecht
About this chapter
Cite this chapter
Jensen, K.F., Simka, H., Mihopoulos, T.G., Futerko, P., Hierlemann, M. (1996). Modeling Approaches for Rapid Thermal Chemical Vapor Deposition. In: Roozeboom, F. (eds) Advances in Rapid Thermal and Integrated Processing. NATO ASI Series, vol 318. Springer, Dordrecht. https://doi.org/10.1007/978-94-015-8711-2_11
Download citation
DOI: https://doi.org/10.1007/978-94-015-8711-2_11
Publisher Name: Springer, Dordrecht
Print ISBN: 978-90-481-4696-3
Online ISBN: 978-94-015-8711-2
eBook Packages: Springer Book Archive