Abstract
A new process for the fabrication of piezoelectric quartz thin films on silicon is investigated. With this process, new silicon-implemented acoustic wave delay lines for sensor applications can be realized. The process consists of low temperature fusion bonding of a piezoelectric quartz wafer to a silicon wafer followed by a back-lap of the quartz to a thickness of between 10 and 50 μm. In this contribution we report on the first step: the fusion bond process.
An annealing temperature of 140°C was found to be sufficient for further micromachining of the wafer stack.
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© 1998 Springer Science+Business Media Dordrecht
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Berthold, A., Sarro, P.M., Vellekoop, M.J. (1998). Quartz-to-Silicon Fusion Bonding for Micro Acoustic Wave Applications. In: van den Berg, A., Bergveld, P. (eds) Sensor Technology in the Netherlands: State of the Art. Springer, Dordrecht. https://doi.org/10.1007/978-94-011-5010-1_34
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DOI: https://doi.org/10.1007/978-94-011-5010-1_34
Publisher Name: Springer, Dordrecht
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