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Two-Dimensional Simulation of Ferroelectric Nonvolatile Memory Cells

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Simulation of Semiconductor Processes and Devices 1998

Abstract

An approach to increase the capabilities of integrated circuit nonvolatile memory is to take advantage of the hysteresis in the polarization of ferroelectric materials. For a rigorous analysis of this and similar devices a suitable model for the ferroelectric effects has been developed. We describe this model and show the results of its implementation into a device simulator.

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References

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© 1998 Springer-Verlag/Wien

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Dragosits, K., Knaipp, M., Selberherr, S. (1998). Two-Dimensional Simulation of Ferroelectric Nonvolatile Memory Cells. In: De Meyer, K., Biesemans, S. (eds) Simulation of Semiconductor Processes and Devices 1998. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6827-1_91

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  • DOI: https://doi.org/10.1007/978-3-7091-6827-1_91

  • Publisher Name: Springer, Vienna

  • Print ISBN: 978-3-7091-7415-9

  • Online ISBN: 978-3-7091-6827-1

  • eBook Packages: Springer Book Archive

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