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The Modeling of Electromigration A New Challenge for TCAD?

  • W. Schoenmaker
  • V. Petrescu
Conference paper

Abstract

It is argued that the modeling of electromigration at the microscopic level results into systems of equations which can be very well addressed by state-of-the-art TCAD methods.

Keywords

Metal Stripe Actual Field Performance Couple Partial Differential Equation Equilibrium Vacancy Effective Valence 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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Copyright information

© Springer-Verlag/Wien 1998

Authors and Affiliations

  • W. Schoenmaker
    • 1
  • V. Petrescu
    • 2
  1. 1.IMECASP divisionLeuvenBelgium
  2. 2.MESA Research InstituteUniversity of TwenteEnschedeNetherlands

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