The Modeling of Electromigration A New Challenge for TCAD?

  • W. Schoenmaker
  • V. Petrescu
Conference paper


It is argued that the modeling of electromigration at the microscopic level results into systems of equations which can be very well addressed by state-of-the-art TCAD methods.


Metal Stripe Actual Field Performance Couple Partial Differential Equation Equilibrium Vacancy Effective Valence 
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Copyright information

© Springer-Verlag/Wien 1998

Authors and Affiliations

  • W. Schoenmaker
    • 1
  • V. Petrescu
    • 2
  1. 1.IMECASP divisionLeuvenBelgium
  2. 2.MESA Research InstituteUniversity of TwenteEnschedeNetherlands

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