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An Agent-based Common Software Platform Applied to Multi-scale Device and Process Simulations

  • Shirun Ho
  • Yasuyuki Ohkura
  • Masato Ikegawa
  • Nobuyuki Mise
  • Joshi Prasad
  • Yuko Kawashima
  • Shoichi Kubo
Conference paper

Abstract

This paper describes a common software platform that allows users to combine multi-scale physical simulations in the form of agents. To demonstrate the benefit of combing multiple simulations, hydrogen desorption at the interface of gate oxide and Si-substrate due to hot electrons in a deep sub-micron device is analysed by coupling device and lattice Monte Carlo simulation. Deposition profiles on a large-scale wafer are studied by using particle method hybridised with continuum simulation. The desorption probability of hydrogen and the coverage of deposition layer are shown to be strongly dependent on the position under the gate and on the wafer respectively.

Keywords

Hydrogen Desorption Hydrodynamic Simulation Deposition Profile Sticking Coefficient Parallel Virtual Machine 
These keywords were added by machine and not by the authors. This process is experimental and the keywords may be updated as the learning algorithm improves.

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References

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Copyright information

© Springer-Verlag Wien 2001

Authors and Affiliations

  • Shirun Ho
  • Yasuyuki Ohkura
    • 1
  • Masato Ikegawa
    • 1
  • Nobuyuki Mise
    • 1
  • Joshi Prasad
    • 2
  • Yuko Kawashima
    • 3
  • Shoichi Kubo
    • 3
  1. 1.Real World Computing PartnershipHitachi, LtdTokyoJapan
  2. 2.TATA ELXSI, LtdBangaloreIndia
  3. 3.Hitachi ULSI Systems Co., Ltd.TokyoJapan

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