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Investigation of a Novel Rapid Thermal Processing Concept Using an Electro-Optically Controlled Radiation Cavity

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Simulation of Semiconductor Processes and Devices 2001

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Abstract

We present numerical investigations of a novel technique for reducing the thermal cycle during lamp-heated rapid-thermal processing (RTP). In our concept the reflective reactor-wall surface is replaced by an electro-optically switchable film, which allows efficient heating and subsequent radiative cooling of processed wafers. Our approach provides an efficient solution to ultrashallow junction requirements for forthcoming CMOS generations.

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References

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  5. Van der Sluis P., Appl. Phys. Lett. 73 (1998) 1826.; Van der Sluis P. et al., Appl. Phys. Lett. 70 (1997) 3356

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  6. Based on U.S. patents 6,047,107 (4 April, 2000) and 6,173,116 (9 Jan., 2001) by Roozeboom F., Duine P.A. and Van der Sluis P; see also Roozeboom F., Van der Sluis P. and Cowern N.E.B., Electrochem. Soc. Symp. Proc. 2001–8 (2001) 41

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Author information

Authors and Affiliations

  1. Philips Research, Prof. Holstlaan 4, 5656 AA Eindhoven, The Netherlands

    F. Roozeboom & P. Van der Sluis

  2. Surrey University, Guildford, U.K

    N. E. B. Cowern

Authors
  1. N. E. B. Cowern
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  2. F. Roozeboom
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  3. P. Van der Sluis
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Editor information

Editors and Affiliations

  1. “Demokritos” National Center for Scientific Research, Institute of Microelectronics, Athens, Greece

    Dimitris Tsoukalas  & Christos Tsamis  & 

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© 2001 Springer-Verlag Wien

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Cowern, N.E.B., Roozeboom, F., Van der Sluis, P. (2001). Investigation of a Novel Rapid Thermal Processing Concept Using an Electro-Optically Controlled Radiation Cavity. In: Tsoukalas, D., Tsamis, C. (eds) Simulation of Semiconductor Processes and Devices 2001. Springer, Vienna. https://doi.org/10.1007/978-3-7091-6244-6_78

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  • DOI: https://doi.org/10.1007/978-3-7091-6244-6_78

  • Publisher Name: Springer, Vienna

  • Print ISBN: 978-3-7091-7278-0

  • Online ISBN: 978-3-7091-6244-6

  • eBook Packages: Springer Book Archive

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