Abstract
Integrated circuits (IC) play a key role in modern digital information society. Superior computational performance is achieved by making transistor faster and assembling more and more elements on a chip, This is achieved by scaling the MOSFET size down. In the past decade the minimum feature size of transistor has been successfully reduced which allowed to double the number of transistors on a chip every second year. This trend is expected to continue in the next decade, as predicted and institutionalized by the International Technology Roadmap for Semiconductors(1) and supported by demonstration of MOSFETs with the gate length as short as 6nm(28).
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
International Technology Roadmap for Semiconductors: 2005 Edition (2005). http://www.itrs.net/Links/2009ITRS/Home2009.htm
Online Simulations and More (2010). http://www.nanohub.org
Ancona, M.G.: Macroscopic description of quantum-mechanical tunneling. Phys. Rev. B 42(2), 1222–1233 (1990)
Ancona, M.G., Tiersten, H.F.: Quantum correction to the equation of state of an electron gas in a semiconductor. Phys. Rev. B 39(13), 9536–9540 (1989)
Ancona, M.G., Yu, Z., Dutton, R.W., Voorde, P.J.V., Cao, M., Vook, D.: Density-gradient analysis of tunneling in MOS structures with ultra-thin oxides. In: Proc. Intl. Conf. Simulation of Semiconductor Processes and Devices, pp. 235–238 (1999)
Ancona, M.G., Yu, Z., Dutton, R.W., Voorde, P.J.V., Cao, M., Vook, D.: Density-gradient analysis of MOS tunneling. IEEE Trans. Electron Devices 47(12), 2310–2319 (2000)
Ando, T., Fowler, A.B., Stern, F.: Electronic properties of two-dimensional systems. Rev. Mod. Phys. 54(2), 437–672 (1982)
Asenov, A., Brown, A.R., Watling, J.R.: Quantum corrections in the simulation of decanano MOSFETs. Solid State Electron. 47(7), 1141–1145 (2003)
Balestra, F., Cristoloveanu, S., Benachir, M., Brini, J., Elewa, T.: Double-gate silicon-on-insulator transistor with volume inversion: a new device with greatly enhanced performance. IEEE Electron Device Lett. 8(9), 410–412 (1987)
Balslev, I.: Influence of uniaxial stress on the indirect absorption edge in silicon and germanium. Phys. Rev. 143, 636–647 (1966)
Blotekjaer, K.: Transport equations for electrons in two-valley semiconductors. IEEE Trans. Electron Devices 17(1), 38–47 (1970)
Bosi, S., Jacoboni, C.: Monte Carlo high field transport in degenerate GaAs. J. Phys. C: Solid State Phys. 9, 315–319 (1976)
Bourgade, J.P., Degond, P., Mehats, F., Ringhofer, C.: On quantum extensions to classical spherical harmonics expansion/Fokker-Planck models. J. Math. Phys. 47(4), 043302 (2006)
Boykin, T.B., Luisier, M., Salmani-Jelodar, M., Klimeck, G.: Strain-induced, off-diagonal, same-atom parameters in empirical tight-binding theory suitable for [110] uniaxial strain applied to a silicon parametrization. Phys. Rev. B 81(12), 125,202 (2010)
Bufler, F.M., Hudé, R., Erlebach, A.: On a simple and accurate quantum correction for Monte Carlo simulations. In: Intl. Workshop Comput. Electroncis, pp. 101–102. Wien (2006)
Buot, F., Jensen, K.: Lattice Weyl-Wigner formulation of exact many-body quantum-transport theory and applications to novel solid-state quantum-based devices. Phys. Rev. B 42(15), 9429–9457 (1990)
Canali, C., Jacoboni, C., Nava, F., Ottaviani, G., Quaranta, A.: Electron drift velocity in silicon. Phys. Rev. B 12(4), 2265–2284 (1975)
Caymax, M., Eneman, G., Bellenger, F., Merckling, C., Delabie, A., Wang, G., Loo, R., Simoen, E., Mitard, J., DeJaeger, B., Hellings, G., DeMeyer, K., Meuris, M., Heyns, M.: Germanium for advanced CMOS anno 2009: A SWOT analysis. In: Intl. Electron Devices Meeting, pp.1–4 (2009)
Colman, D., Bate, R.T., Mize, J.P.: Mobility anisotropy and piezoresistance in silicon p-type inversion layers. J. Appl. Phys. 39(4), 1923–1931 (1968)
Curatola, G., Fiori, G., Iannaccone, G.: Modeling and simulation challenges for nanoscale mosfets in the ballistic limit. Solid State Electron. 48(4), 581–587 (2004)
Datta, S.: Electronic Transport In Mesoscopic Systems. Cambridge University Press, Cambridge (1995)
Datta, S.: Quantum Transport: Atom To Transistor. Cambridge University Press, Cambridge (2005)
Degond, P., Ringhofer, C.: Quantum moment hydrodynamics and entropy principle. J. Stat. Phys. 112(3), 587–628 (2003)
DeMari, A.: An accurate numerical steady-state one-dimensional solution of the p-n junction. Solid State Electron. 11, 33–58 (1968)
Dhar, S., Kosina, H., Palankovski, V., Ungersboeck, E., Selberherr, S.: Electron mobility model for strained-Si devices. IEEE Trans. Electron Devices 52(4), 527–533 (2005)
Dhar, S., Ungersboeck, E., Kosina, H., Grasser, T., Selberherr, S.: Electron mobility model for ⟨110⟩ stressed silicon including strain-dependent masses. IEEE Trans. Nanotechnol. 6(1), 97–100 (2007)
Donetti, L., Gámiz, F., Rodriguez, N., Jamenez, F., Sampedro, C.: Influence of acoustic phonon confinement on electron mobility in ultrathin silicon on insulator layers. Appl. Phys. Lett. 88(1), 122108(1–3) (2006)
Doris, B., Ieong, M., Kanarsky, T., Zhang, Y., Roy, R.A., Documaci, O., Ren, Z., Jamin, F.F., Shi, L., Natzle, W., Huang, H.J., Mezzapelle, J., Mocuta, A., Womack, S., Gribelyuk, M., Jones, E.C., Miller, R.J., Wong, H.S.P., Haensch, W.: Extreme scaling with ultra-thin si channel MOSFETs. In: Intl. Electron Devices Meeting, pp. 267–270 (2002)
van Dort, M.J., Woerlee, P.H., Walker, A.J.: A simple model for quantization effects in heavily-doped silicon MOSFETs at inversion conditions. Solid State Electron. 37(3), 411–414 (1994)
Egley, J., Chidambarao, D.: Strain effects on devide characteristics: Implementation in drift-difusion simulators. Solid State Electron. 36(12), 1653–1664 (1993)
Esseni, D.: On the modeling of surface roughness limited mobility in SOI MOSFETs and its correlation to the transistor effective field. IEEE Trans. Electron Devices 51(3), 394–401 (2004)
Esseni, D., Abramo, A.: Mobility modelling of SOI MOSFETs. Semicond. Sci. Technol. 19, S67–S70 (2004)
Esseni, D., Mastrapasqua, M., Celler, G., Fiegna, C., Selmi, L., Sangiorgi, E.: An experimental study of mobility enhancement in ultrathin SOI transistors operated in double-gate mode. IEEE Trans. Electron Devices 50(3), 802–808 (2003)
Fan, X.F., Register, L.F., Winstead, B., Foisy, M.C., Chen, W.Q., Zheng, X., Ghosh, B., Banerjee, S.K.: Hole mobility and thermal velocity enhancement for uniaxial stress in Si up to 4GPa. IEEE Trans. Electron Devices 54(2), 291–296 (2007)
Fawcett, W., Boardman, A., Swain, S.: Monte Carlo determination of electron transport properties in gallium arsenide. J. Phys. Chem. Solids 31, 1963–1990 (1970)
Fawcett, W., Paige, E.: Negative differential mobility of electrons in germanium: A Monte Carlo calculation of the distribution function, drift velocity and carrier population in the<111>and<100>minima. J. Phys. C: Solid State Phys. 4, 1801–1821 (1971)
Ferry, D., Akis, R., Vasileska, D.: Quantum effects in MOSFETs: Use of an effective potential in 3D Monte Carlo simulations in ultra-short channel devices. In: Intl. Electron Devices Meeting, pp. 287–290 (2000)
Fischetti, M., Laux, S.: Monte Carlo simulation of electron transport in Si: The first 20 years. In: Baccarani, G., Rudan, M. (eds.) 26th European Solid State Device Research Conference, pp. 813–820. Editions Frontiers, Bologna, Italy (1996)
Fischetti, M.V.: Theory of electron transport in small semiconductor devices using the Pauli master equation. J. Appl. Phys. 83(1), 270–291 (1998)
Fischetti, M.V.: Master-equation approach to the study of electronic transport in small semiconductor devices. Phys. Rev. B 59(7), 4901–4917 (1999)
Fischetti, M.V., Gámiz, F., Hänsch, W.: On the enhanced electron mobility in strained-silicon inversion layers. J. Appl. Phys. 92(12), 7320–7324 (2002)
Fischetti, M.V., Laux, S.E.: Monte Carlo analysis of electron transport in small semiconductor devices including band-structure and space-charge effects. Phys. Rev. B 38(14), 9721–9745 (1988)
Fischetti, M.V., Ren, Z., Solomon, P.M., Yang, M., Rim, K.: Six-band k⋅p calculation of the hole mobility in silicon inversion layers: Dependence on surface orientation, strain, and silicon thickness. J. Appl. Phys. 94(2), 1079–1095 (2003)
Frensley, W.: Quantum transport simulation of the resonant tunneling diode. In: Intl. Electron Devices Meeting, Los Angeles, pp. 571–574 (1986)
Frensley, W.: Transient response of a tunneling device obtained from the Wigner function. Phys. Rev. Lett. 57(22), 2853–2856 (1986)
Frensley, W.: Wigner-function model of a resonant-tunneling semiconductor device. Phys. Rev. B 36(3), 1570–1580 (1987)
Frensley, W.: Effect of inelastic processes on the self-consistent potential in the resonant-tunneling diode. Solid State Electron. 32(12), 1235–1239 (1989)
Frensley, W.: Boundary conditions for open quantum systems driven far from equilibrium. Rev. Mod. Phys. 62(3), 745–791 (1990)
Frensley, W.: Numerical evaluation of resonant states. Superlattices Microstructures 11(3), 347–350 (1992)
Gebauer, R., Car, R.: Current in open quantum qystems. Phys. Rev. Lett. 93(16), 160,404 (2004)
Gebauer, R., Car, R.: Kinetic theory of quantum transport at the nanoscale. Phys. Rev. B 70(12), 125,324 (2004)
Gehring, A., Grasser, T., Kosina, H., Selberherr, S.: Simulation of hot-electron oxide tunneling current based on a non-Maxwellian electron energy distribution function. J. Appl. Phys. 92(10), 6019–6027 (2002)
Gehring, A., Kosina, H.: Wigner-function based simulation of quantum transport in scaled DG-MOSFETs using the Monte Carlo method. J. Comput. Electron. 4(1–2), 67–70 (2005)
Gilbert, M., Akis, R., Ferry, D.: Phonon-assisted ballistic to diffusive crossover in silicon nanowire transistors. J. Appl. Phys. 98(9), 094,303–1–8 (2005)
Grasser, T., Jungemann, C., Kosina, H., Meinerzhagen, B., Selberherr, S.: Advanced transport models for sub-micrometer devices. In: Proc. Intl. Conf. Simulation of Semiconductor Processes and Devices, pp. 1–8 (2004)
Grasser, T., Kosik, R., Jungemann, C., Kosina, H., Selberherr, S.: Nonparabolic macroscopic transport models for device simulation based on bulk Monte Carlo data. J. Appl. Phys. 97(9), 0937,101–09371,012 (2005)
Grasser, T., Kosina, H., Gritsch, M., Selberherr, S.: Using six moments of Boltzmann’s transport equation for device simulation. J. Appl. Phys. 90(5), 2389–2396 (2001)
Grasser, T., Kosina, H., Heitzinger, C., Selberherr, S.: Characterization of the hot electron distribution function using six moments. J. Appl. Phys. 91(6), 3869–3879 (2002)
Grasser, T., Kosina, H., Selberherr, S.: An impact ionization model including non-maxwellian and non-parabolicity effects. In: Proc. Intl. Conf. Simulation of Semiconductor Processes and Devices, pp. 46–49 (2001)
Grasser, T., Kosina, H., Selberherr, S.: Hot carrier effects within macroscopic transport models. Intl. J. High Speed Electron. 13(3), 873–901 (2003)
Gritsch, M.: Numerical modeling of SOI MOSFETs. Dissertation, Technische Universität Wien (2002). http://www.iue.tuwien.ac.at/phd/gritsch
Gritsch, M., Kosina, H., Grasser, T., Selberherr, S.: Influence of generation/recombination effects in simulations of partially depleted SOI MOSFETs. Solid State Electron. 45(4), 621–627 (2001)
Gritsch, M., Kosina, H., Grasser, T., Selberherr, S.: Revision of the standard hydrodynamic transport model for SOI simulation. IEEE Trans. Electron Devices 49(10), 1814–1820 (2002)
Gummel, H.: A self-consistent iterative scheme for one-dimensional steady state transistor calculations. IEEE Trans. Electron Devices 11, 455–465 (1964)
Hänsch, W., Vogelsang, T., Kircher, R., Orlowski, M.: Carrier transport near the Si/SiO2 interface of a MOSFET. Solid State Electron. 32(10), 839–849 (1989)
Heinz, F., Schenk, A., Scholze, A., Fichtner, W.: Full quantum simulation of silicon-on-insulator single-electron devices. J. Comput. Electron. 1(1), 161–164 (2002)
Herring, C., Vogt, E.: Transport and deformation-potential theory for many-valley semiconductors with anisotropic scattering. Phys. Rev. 101(3), 944–961 (1956)
Hockney, R., Eastwood, J.W.: Computer Simulation Using Particles. Adam Hilger, Bristol and Philadelphia (1988)
Iafrate, G.J., Grubin, H.L., Ferry, D.K.: Utilization of quantum-distribution function for ultra-submicron device transport. J. Phys. 42, 307–312 (1981)
Institut für Mikroelektronik: MINIMOS-NT 2.1 User’s Guide. Technische Universität Wien, Austria (2010)
Irie, H., Kita, K., Kyuno, K., Toriumi, A.: In-plane mobility anisotropy and universality under uni-axial strains in nand p-MOS inversion layers on (100), [110], and (111) Si. In: Intl. Electron Devices Meeting, pp. 225–228 (2004)
Jackson, J.: Classical Electrodynamics, Third Edition. Academic Press, New York (1998)
Jacoboni, C.: A new approach to Monte Carlo simulation. In: Intl. Electron Devices Meeting, pp. 469–472. IEEE Electron Devices Society, Washington, D.C. (1989)
Jacoboni, C., Minder, R., Majni, G.: Effects of band non-parabolicity on electron drift velocity in silicon above room temperature. J. Phys. Chem. Solids 36, 1129–1133 (1975)
Jacoboni, C., Poli, P., Rota, L.: A new Monte Carlo technique for the solution of the Boltzmann transport equation. Solid State Electron. 31(3/4), 523–526 (1988)
Jacoboni, C., Reggiani, L.: The Monte Carlo method for the solution of charge transport in semiconductors with applications to covalent materials. Rev. Mod. Phys. 55(3), 645–705 (1983)
John, D.L., Castro, L.C., Pereira, P.J.S., Pulfrey, D.L.: A Schrödinger-Poisson solver for modeling carbon nanotube FETs. In: Proc. of Nanotech 2004 (2004)
Jungel, A.: Quasi-hydrodynamic semiconductor equations, In: Progress in Nonlinear Differential Equations and Their Applications, vol.41. A Birkhauser book, Switzerland (2001)
Jungemann, C., Meinerzhagen, B.: Hierarchical Device Simulation. The Monte Carlo Perspective. Springer, New york (2003)
Jungemann, C., Nguyen, C.D., Neinhüs, B., Decker, S., Meinerzhagen, B.: Improved modified local density approximation for modeling of size quantization in nMOSFETs. In: Proc. Intl. Conf. Modeling and Simulation of Microsystems, pp. 458–461 (2001)
Jungemann, C., Pham, A.T., Meinerzhagen, B.: A linear response Monte Carlo algorithm for inversion layers and magnetotransport. In: Proc. Intl. Workshop Comput. Electronics, pp.13–14 (May, 2006)
Kadanoff, L.P., Baym, G.: Quantum Statistical Mechanics. Benjamin, New York (1962)
Kathawala, G., Winstead, B., Ravaioli, U.: Monte Carlo simulations of double-gate MOSFETs. IEEE Trans. Electron Devices 50(12), 2467–2473 (2003)
Kennedy, D.: On the ambipolar diffusion of impurities into silicon. Proc. IEEE 54(6), 1202–1203 (1969)
Klimeck, G., Luisier, M.: From nemo1d and nemo3d to omen: Moving towards atomistic 3-d quantum transport in nano-scale semiconductors. In: Intl. Electron Devices Meeting, pp. 1–4 (2008)
Kluksdahl, N., Kriman, A., Ferry, D., Ringhofer, C.: Self-consistent study of the resonant-tunneling diode. Phys. Rev. B 39(11), 7720–7735 (1989)
Kluksdahl, N., Pötz, W., Ravaioli, U., Ferry, D.: Wigner function study of a double quantum barrier resonant tunneling diode. Superlattices Microstructures 3(1), 41–45 (1987)
Kobayashi, M., Irisawa, T., Magyari-Kope, B., Saraswat, K., Wong, H.S., Nishi, Y.: Uniaxial stress engineering for high-performance Ge NMOSFETs. IEEE Trans. Electron Devices 57(5), 1037 –1046 (2010)
Kosina, H., Nedjalkov, M.: Handbook Of Theoretical And Computational Nanotechnology, vol.10, chap. Wigner function based device modeling, pp. 731–763. American Scientific, Los Angeles (2006)
Kosina, H., Nedjalkov, M., Selberherr, S.: Theory of the Monte Carlo method for semiconductor device simulation. IEEE Trans. Electron Devices 47(10), 1899–1908 (2000)
Kosina, H., Nedjalkov, M., Selberherr, S.: A Monte Carlo method seamlessly linking quantum and classical transport calculations. J. Comput. Electron. 2(2–4), 147–151 (2002)
Kosina, H., Nedjalkov, M., Selberherr, S.: A Monte Carlo method seamlessly linking classical and quantum transport calculations. J. Comp. Electron. 2(2–4), 147–151 (2003)
Kosina, H., Nedjalkov, M., Selberherr, S.: Quantum Monte Carlo Simulation Of A Resonant Tunneling Diode Including Phonon Scattering. In: Laudon, M., Romanowicz, B. (eds.) Nanotech, Computational Publications, San Francisco, pp. 190–193 (2003)
Kosina, H., Nedjalkov, M., Selberherr, S.: A stable backward Monte Carlo method for the solution of the Boltzmann equation. In: Lecture Notes in Computer Science 2907: Large-Scale Scientific Computing, Springer, Berlin, pp. 170–177 (2003)
Kosina, H., Selberherr, S.: Device simulation demands of upcoming microelectronics devices. Intl. J. High Speed Electron. 16(1), 115–136 (2006)
Kosina, H., Sverdlov, V., Grasser, T.: Wigner Monte Carlo simulation: Particle annihilation and device applications. In: Proc. Intl. Conf. on Simulation of Semiconductor Processes and Devices, pp. 357–360 (2006)
Kotlyar, R., Giles, M., Cea, S., Linton, T., Shifren, L., Weber, C., Stettler, M.: Modeling the effects of applied stress and wafer orientation in silicon devices: From long channel mobility physics to short channel performance. J. Comput. Electron. 8(2), 110–123 (2009)
Kotlyar, R., Weber, C., Shifren, L., Cea, S., Giles, M., Stettler, M.: Effect of band warping and wafer orientation on NMOS mobility under arbitrary applied stress. J. Comput. Electron. 7(3), 95–98 (2007)
Krishnamohan, T., Jungemann, C., Kim, D., Ungersboeck, E., Selberherr, S., Wong, P., Nishi, Y., Saraswat, K.: Theoretical investigation of performance in uniaxially- and biaxially-strained Si, SiGe and Ge double-gate p-MOSFETs. In: Intl. Electron Devices Meeting, pp. 937–940 (2006)
Kunikiyo, T., Takenaka, M., Kamakura, Y., Yamaji, M., Mizuno, H., Morifuji, M., Taniguchi, K., Hamaguchi, C.: A Monte Carlo simulation of anisotropic electron transport in silicon including full band structure and anisotropic impact-ionization model. J. Appl. Phys. 75(1), 297–312 (1994)
Kurosawa, T.: Monte Carlo calculation of hot electron problems. In: Proc. Intl. Conf. on Physics of Semiconductors, pp. 424–426 (1966)
Lake, R., Datta, S.: Nonequilibrium Green’s-function method applied to double-barrier resonant-tunneling diodes. Phys. Rev. B 45(12), 6670–6685 (1992)
Lake, R., Klimeck, G., Bowen, R.C., Jovanovic, D.: Single and multiband modeling of quantum electron transport through layered semiconductor devices. J. Appl. Phys. 81(12), 7845–7869 (1997)
Laux, S., Kumar, A., Fischetti, M.: Ballistic FET modeling using QDAME: Quantum device analysis by modal evaluation. IEEE Trans. Nanotechnol. 1(4), 255–259 (2002)
Lent, C., Kirkner, D.: The quantum transmitting boundary method. J. Appl. Phys. 67(10), 6353–6359 (1990)
Likharev, K.K.: Sub-20-nm electron devices. In: Morkoc, H. (ed.) Advanced Semiconductor and Organic Nano-Techniques, Academic Press, New York, pp. 239–302 (2003)
Lindblad, G.: On the generators of quantum dynamical semigroups. Comm. Math. Phys. 48, 119–130 (1976)
Loeb, H., Andrew, R., Love, W.: Application of 2-dimensional solutions of the Shockley-Poisson equation to inversion-layer M.O.S.T. devices. Electron. Lett. 4, 352–354 (1968)
Louisell, W.H.: Quantum Statistical Properties Of Radiation. Willey, New York (1973)
Lucci, L., Palestri, P., D.Esseni, Selmi, L.: Multi-subband Monte-Carlo modeling of nano-MOSFETs with strong vertical quantization and electron gas degeneration. In: Intl. Electron Devices Meeting, pp. 531–534 (2005)
Lugli, P., Ferry, D.K.: Degeneracy in the ensemble Monte Carlo method for high field transport in semiconductors. IEEE Trans. Electron Devices 32(11), 2431–2437 (1985)
Luisier, M., Schenk, A., Fichtner, W., Klimeck, G.: Atomistic simulations of nanowires in the sp 3 d 5 s ∗ tight-binding formalism: From boundary conditions to strain calculations. Phys. Rev. B 74, 205323(1–12) (2006)
Lundstrom, M.: Fundamentals Of Carrier Transport. Cambridge University Press, Cambridge (2000)
Mahan, G.: Many-Particle Physics. Premium Press, New York (1990)
Mains, R.K., Haddad, G.I.: Time-dependent modeling of resonant-tunneling diodes from direct solution of the Schrödinger equation. J. Appl. Phys. 64(7), 3564–3569 (1988)
Manku, T., Nathan, A.: Electron drift mobility model for devices based on unstrained and coherently strained Si1−x Ge x grown on<001>silicon substrate. IEEE Trans. Electron Devices 39(9), 2082–2089 (1992)
Martinez, A., Barker, J.R., Anantram, M.P., Svizhenko, A., Asenov, A.: Developing a full 3D NEGf simulator with random dopant and interface roughness. In: Intl. Workshop Comput. Electroncis, Wien, pp. 275–276 (2006)
Martinez, A., Svizhenko, A., Anantram, M.P., Barker, J.R., Brown, A.R., Asenov, A.: A study of the effect of the interface roughness on a DG-MOSFET using a full 2D NEGF technique. In: Intl. Electron Devices Meeting, pp. 627–630 (2005)
Mistry, K., Allen, C., Auth, C., Beattie, B., Bergstrom, D., Bost, M., Brazier, M., Buehler, M., Cappellani, A., Chau, R., Choi, C.H., Ding, G., Fischer, K., Ghani, T., Grover, R., Han, W., Hanken, D., Hattendorf, M., He, J., Hicks, J., Huessner, R., Ingerly, D., Jain, P., James, R., Jong, L., Joshi, S., Kenyon, C., Kuhn, K., Lee, K., Liu, H., Maiz, J., Mclntyre, B., Moon, P., Neirynck, J., Pae, S., Parker, C., Parsons, D., Prasad, C., Pipes, L., Prince, M., Ranade, P., Reynolds, T., Sandford, J., Shifren, L., Sebastian, J., Seiple, J., Simon, D., Sivakumar, S., Smith, P., Thomas, C., Troeger, T., Vandervoorn, P., Williams, S., Zawadzki, K.: A 45nm logic technology with high-k+metal gate transistors, strained silicon, 9 Cu interconnect layers, 193nm dry patterning, and 100% Pb-free packaging. In: Intl. Electron Devices Meeting, pp. 247–250 (2007)
Moglestue, C.: Monte Carlo particle modelling of small semiconductor devices. Comput. Methods Appl. Mech. Eng. 30, 173–208 (1982)
Nainani, A., Raghunathan, S., Witte, D., Kobayashi, M., Irisawa, T., Krishnamohan, T., Saraswat, K., Bennett, B., Ancona, M., Boos, J.: Engineering of strained III-V heterostructures for high hole mobility. In: Intl. Electron Devices Meeting, pp. 1 –4 (2009)
Natarajan, S., Armstrong, K., Bost, M., Brain, R., Brazier, M., Chang, C.H., Chikarmane, V., Childs, M., Deshpande, H., Dev, K., Ding, G., Ghani, T., Golonzka, O., Han, W., He, J., Heussner, R., James, R., Jin, I., Kenyon, C., Klopcic, S., Lee, S.H., Liu, M., Lodha, S., McFadden, B., Murthy, A., Neiberg, L., Neirynck, J., Packan, P., Pae, S., Parker, C., Pelto, C., Pipes, L., Sebastian, J., Seiple, J., Sell, B., Sivakumar, S., Song, B., Tone, K., Troeger, T., Weber, C., Yang, M., Yeoh, A., Zhang, K.: A 32nm logic technology featuring 2nd-generation high-k + metal-gate transistors, enhanced channel strain and 0.171μm2 SRAM cell size in a 291Mb array. In: Intl. Electron Devices Meeting, pp. 941–943 (2008)
Natori, K.: Ballistic metal-oxide-semiconductor field-effect transistor. J. Appl. Phys. 78(8), 4879–4890 (1994)
Naveh, Y., Likharev, K.K.: Modeling of 10nm-scale ballistic MOSFETs. IEEE Electron Device Lett. 21(5), 242–244 (2000)
Nedjalkov, M., Kosik, R., Kosina, H., Selberherr, S.: Wigner transport through tunneling structures - scattering interpretation of the potential operator. In: Simulation of Semiconductor Processes and Devices, Publication Office Business Center for Academic Societies Japan, Kobe, Japan, pp. 187–190 (2002)
Nedjalkov, M., Kosina, H., Selberherr, S., Ringhofer, C., Ferry, D.K.: Unified particle approach to wigner-boltzmann transport in small semiconductor devices. Phys. Rev. B 70(11), 115,319 (2004). DOI 10.1103/PhysRevB.70.115319
Nedjalkov, M., Vasileska, D., Ferry, D.K., Jacoboni, C., Ringhofer, C., Dimov, I., Palankovski, V.: Wigner transport models of the electron-phonon kinetics in quantum wires. Phys. Rev. B 74(3), 035,311 (2006). DOI 10.1103/PhysRevB.74.035311
Nedjalkov, M., Vitanov, P.: Iteration approach for solving the Boltzmann equation with the Monte Carlo method. Solid State Electron. 32(10), 893–896 (1989)
Nguyen, B.Y., Mazure, C., Delprat, D., Aulnette, C., Daval, N., Andrieu, F., Faynot, O.: Overview of FDSOI technology from substrate to device. In: Semiconductor Device Research Symposium, 2009. ISDRS ’09. Intl., pp. 1 –2 (2009)
Nguyen, C.D., Jungemann, C., Meinerzhagen, B.: Modeling of size quantization in strained Si-nMOSFETs with the improved modified local density approximation. In: Proc. Nanotech 2005 Vol. 3, pp. 33–36 (2005)
Paasch, G., Übensee, H.: Carrier density near the semiconductor-insulator interface - local density approximation for non-isotropic effective mass. Phys. Stat. Sol. (b) 118(1), 255–266 (1983)
Packan, P., Akbar, S., Armstrong, M., Bergstrom, D., Brazier, M., Deshpande, H., Dev, K., Ding, G., Ghani, T., Golonzka, O., Han, W., He, J., Heussner, R., James, R., Jopling, J., Kenyon, C., Lee, S.H., Liu, M., Lodha, S., Mattis, B., Murthy, A., Neiberg, L., Neirynck, J., Pae, S., Parker, C., Pipes, L., Sebastian, J., Seiple, J., Sell, B., Sharma, A., Sivakumar, S., Song, B., St.Amour, A., Tone, K., Troeger, T., Weber, C., Zhang, K., Luo, Y., Natarajan, S.: High performance 32nm logic technology featuring 2nd generation high-k + metal gate transistors. IEDM Proc. pp. 1–4 (2009)
Palestri, P., Eminente, S., Esseni, D., Fiegna, C., Sangiorgi, E., Selmi, L.: An improved semi-classical Monte-Carlo approach for nano-scale MOSFET simulation. Solid State Electron. 49, 727–732 (2005)
Palestri, P., Esseni, D., Eminente, S., Fiegna, C., Sangiorgi, E., Selmi, L.: Understanding quasi-ballistic transport in nano-MOSFETs: Part I - scattering in the channel, and in the drain. IEEE Trans. Electron Devices 52(12), 2727–2735 (2005)
Pham, A., Jungemann, C., Meinerzhagen, B.: Deterministic multisubband device simulations for strained double gate PMOSFETs including magnetotransport. In: Intl. Electron Devices Meeting, pp. 895–898 (2008)
Pourfath, M., Kosina, H.: Fast convergent Schrödinger-Poisson solver for the static and dynamic analysis of carbon nanotube field effect transistors. Lecture Notes in Computer Science 3743, 578–585, (2006)
Prange, R.E., Nee, T.W.: Quantum spectroscopy of the low-field oscillations in the surface impedance. Phys. Rev. 168(3), 779–786 (1968)
Price, P.J.: Monte Carlo calculation of electron transport in solids. Semiconductors Semimetals 14, 249–308 (1979)
Price, P.J.: Resonant tunneling via an accumulation layer. Ann. Phys. 133, 217 (1981)
Querlioz, D., Dollfus, P.: The Wigner Monte Carlo Method For Nanoelectronic Devices - A Particle Description Of Quantum Transport And Decoherence. Wiley, New York (2010)
Querlioz, D., Saint-Martin, J., Do, V.N.: A study of quantum transport in end-of-Roadmap DG-MOSFETs using a fully self-consistent Wigner Monte Carlo approach. IEEE Trans. Nanotechnol. 5(6), 737–744 (2006)
Radosavljevic, M., Ashley, T., Andreev, A., Coomber, S., Dewey, G., Emeny, M., Fearn, M., Hayes, D., Hilton, K., Hudait, M., Jefferies, R., Martin, T., Pillarisetty, R., Rachmady, W., Rakshit, T., Smith, S., Uren, M., Wallis, D., Wilding, P., Chau, R.: High-performance 40nm gate length insb p-channel compressively strained quantum well field effect transistors for low-power (v CC =0.5V) logic applications. In: Intl. Electron Devices Meeting, pp. 1–4 (2008)
Radosavljevic, M., Chu-Kung, B., Corcoran, S., Dewey, G., Hudait, M., Fastenau, J., Kavalieros, J., Liu, W., Lubyshev, D., Metz, M., Millard, K., Mukherjee, N., Rachmady, W., Shah, U., Chau, R.: Advanced high-k gate dielectric for high-performance short-channel in0.7ga0.3as quantum well field effect transistors on silicon substrate for low power logic applications. In: Intl. Electron Devices Meeting, pp. 1–4 (2009)
Ravaioli, U., Osman, M., Pötz, W., Kluksdahl, N., Ferry, D.: Investigation of ballistic transport through resonant-tunneling quantum wells using Wigner function approach. Physica B 134, 36–40 (1985)
Reggiani, L., Lugli, P., Gantsevich, S., Gurevich, V., Katilius, R.: Diffusion and fluctuations in a nonequilibrium electron gas with electron-electron collisions. Phys. Rev. B 40(18), 12,209–12,214 (1989). DOI 10.1103/PhysRevB.40.12209
Risch, L.: Pushing CMOS beyond the roadmap. In: Proc. European Solid-State Device Research Conf., pp. 63–68 (2005)
Sabathil, M., Hackenbuchner, S., Majewski, J.A., Zandler, G., Vogl, P.: Towards fully quantum mechanical 3D device simulations. J. Comput. Electron. 1, 81–85 (2002)
Scharfetter, D., Gummel, H.: Large-signal analysis of a silicon read diode oscillator. IEEE Trans. Electron Devices 16(1), 64–77 (1969)
Schroeder, J., Muller, R.: IGFET analysis through numerical solution of Poisson’s equation. IEEE Trans. Electron Devices 15(12), 954–961 (1968)
Selberherr, S.: Analysis and Simulation of Semiconductor Devices. Springer, Heidelberg (1984)
Serra, N., Esseni, D.: Mobility enhancement in strained n-FinFETs: Basic insight and stress engineering. IEEE Trans. Electron Devices 57(2), 482 –490 (2010)
Shichijo, H., Hess, K.: Band-structure-dependent transport and impact ionization in GaAs. Phys. Rev. B 23(8), 4197–4207 (1981)
Shifren, L., Ferry, D.K.: A Wigner function based ensemble Monte Carlo approach for accurate incorporation of quantum effects in device simulation. J. Comput. Electron. 1, 55–58 (2002)
Shifren, L., Ringhofer, C., Ferry, D.: Inclusion of nonlocal scattering in quantum transport. Phys. Lett. A 306, 332–336 (2003)
Shifren, L., Ringhofer, C., Ferry, D.: A Wigner function-based quantum ensemble Monte Carlo study of a resonant tunneling diode. IEEE Trans. Electron Devices 50(3), 769–773 (2003)
Shimizu, K., Saraya, T., Hiramoto, T.: Suppression of electron mobility degradation in (100)-oriented double-gate ultrathin body nMOSFETs. IEEE Electron Device Lett. 31(4), 284–286 (2010)
Shoji, M., Horiguchi, S.: Electronic structure and phonon-limited electron mobility of double-gate silicon-on-insulator si inversion layers. J. Appl. Phys. 85(5), 2722–2731 (1999)
Silvaco, Santa Clara, CA: ATLAS user’s manual (2010)
Slotboom, J.: Iterative scheme for 1- and 2-dimensional d.c.-transistor simulation. Electron. Lett. 5, 677–678 (1969)
Smirnov, S., Kosina, H., Nedjalkov, M., Selberherr, S.: Monte Carlo method for modeling of small signal response including the Pauli exclusion principle. J. Appl. Phys. 94(9), 5791–5799 (2003)
Smith, C.S.: Piezoresistance effect in germanium and silicon. Phys. Rev. 94(1), 42–49 (1954)
Sonoda, K.I., Yamaji, M., Taniguchi, K., Hamaguchi, C., Dunham, S.T.: Moment expansion approach to calculate impact ionization rate in submicron silicon devices. J. Appl. Phys. 80(9), 5444–5448 (1996)
Stern, F., Howard, W.E.: Properties of semiconductor surface inversion layers in the electric quantum limit. Phys. Rev. 163(3), 816–835 (1967)
Stratton, R.: Diffusion of hot and cold electrons in semiconductor barriers. Phys. Rev. 126(6), 2002–2014 (1962)
Sun, G., Sun, Y., Nishida, T., Thompson, S.E.: Hole mobility in silicon inversion layers: Stress and surface orientation. J. Appl. Phys. 102(8), 084501 (2007)
Sverdlov, V., Gehring, A., Kosina, H., Selberherr, S.: Quantum transport in ultra-scaled double-gate MOSFETs: A Wigner function-based Monte Carlo approach. Solid State Electron. 49(9), 1510–1515 (2005)
Sverdlov, V., Ungersboeck, E., Kosina, H., Selberherr, S.: Volume inversion mobility in SOI MOSFETs for different thin body orientations. Solid State Electron. 51, 299–305 (2007)
Sverdlov, V., Ungersboeck, E., Kosina, H., Selberherr, S.: Influence of uniaxial [110] stress on silicon band structure and electron low-field mobility in ultra-thin body SOI FETs. In: Proc. EUROSOI 2007, pp. 39–40 (January, 2007)
Sverdlov, V.A., Selberherr, S.: Electron subband structure and controlled valley splitting in silicon thin-body SOI FETs: Two-band k⋅p theory and beyond. Solid State Electron. 52(12), 1861–1866 (2008)
Sverdlov, V.A., Walls, T.J., Likharev, K.K.: Nanoscale silicon MOSFETs: A theoretical study. IEEE Trans. Electron Devices 50(9), 1926–1933 (2003)
Svizhenko, A., Anantram, M.: Effect of Scattering and Contacts on Current and Electrostatics in Carbon Nanotubes. Phys. Rev. B 72, 085,430–085,440 (2005)
Svizhenko, A., Anantram, M.P.: Role of scattering in nanotransistors. IEEE Trans. Electron Devices 50, 1459–1466 (2003)
Svizhenko, A., Anantram, M.P., Govindan, T.R., Biegel, B., Venugopal, R.: Two-dimensional quantum mechanical modeling of nanotransistors. J. Appl. Phys. 91, 2343–2354 (2002)
Synopsys, Mountain View, CA: Sentaurus device user’s manual (2010)
Takagi, S.I., Toriumi, A., Iwase, M., Tango, H.: On the universality of inversion layer mobility in Si MOSFETs: Part I - effects of substrate impurity concentration. IEEE Trans. Electron Devices 41(12), 2357–2362 (1994)
Thompson, S.E., Armstrong, M., Auth, C., Alavi, M., Buehler, M., Chau, R., Cea, S., Ghani, T., Glass, G., Hoffmann, T., Jan, C.T., Kenyon, C., Klaus, J., Kuhn, K., Ma, Z., McIntyre, B., Mistry, K., Murthy, A., Obradovic, B., Nagisetty, R., Nguyen, P., Sivakumar, S., Shaheed, R., Shifren, L., Tufts, B., Tyagi, S., Bohr, M., El-Mansy, Y.: A 90-nm logic nanotechnology featuring strained-silicon. IEEE Trans. Electron Devices 51(11), 1790–1797 (2004)
Thompson, S.E., Armstrong, M., Auth, C., Cea, S., Chau, R., Glass, G., Hoffmann, T., Klaus, J., Ma, Z., McIntyre, B., Murthy, A., Obradovic, B., Shifren, L., Sivakumar, S., Tyagi, S., Ghani, T., Mistry, K., Bohr, M., El-Mansy, Y.: A logic nanotechnology featuring strained-silicon. IEEE Electron Device Lett. 25(4), 191–193 (2004)
Thompson, S.E., Suthram, S., Sun, Y., Sun, G., Pathasarathy, S., Chu, M., Nishida, T.: Future of strained Si/semiconductors in nanoscale MOSFETs. In: Intl. Electron Devices Meeting, pp. 681–684 (2006)
Trellakis, A., Zibold, T., Andalauer, T., Smith, S.B.A.K., Morschal, R., Vogl, P.: The 3D nanometer device project nextnano3: Concepts, methods, results. In: Intl. Workshop Comput. Electroncis, Wien, pp. 173–174 (2006)
Tsutsui, G., Saitoh, M., Saraya, T., Nagumo, T., Hiramoto, T.: Mobility enhancement due to volume inversion in (110)-oriented ultra-thin body double-gate nMOSFETs with body thickness less than 5nm. In: Intl. Electron Devices Meeting, pp. 747–750 (2005)
Uchida, K., Koga, J., Takagi, S.: Experimental study on carrier transport mechanisms in double- and single-gate ultrathin-body MOSFETs - Coulomb scattering, volume inversion, and δt SOI -induced scattering. In: Intl. Electron Devices Meeting, pp. 805–808 (2003)
Uchida, K., Krishnamohan, T., Saraswat, K.C., Nishi, Y.: Physical mechanisms of electron mobility enhancement in uniaxial stressed MOSFETs and impact of uniaxial stress engineering in ballistic regime. In: Intl. Electron Devices Meeting, pp. 129–132 (2005)
Ungersboeck, E., Dhar, S., Karlowatz, G., Sverdlov, V., Kosina, H., Selberherr, S.: The effect of general strain on band structure and electron mobility of silicon. IEEE Trans. Electron Devices 54(9), 2183–2190 (2007)
Aubry-Fortuna, V., Dollfus,P., Galdin-Retailleau, S.: Electron effective mobility in strained-Si/Si1−x Ge x MOS devices using Monte Carlo simulation. Solid State Electron. 49(8), 1320–1329 (2005)
Vasileska, D., Ferry, D., Goodnick, S.: Handbook Of Theoretical And Computational Nanotechnology, vol.10, chap. Computational Nanoelectronics, American Scientific, Los Angeles, pp. 1–135 (2006)
Venugopal, R., Ren, Z., Datta, S., Lundstrom, M.S., Jovanovic, D.: Simulation of quantum transport in nanoscale transistors: Real versus mode-space approach. J. Appl. Phys. 92(7), 3730–3739 (2002)
VMC2.0: Vienna Monte Carlo 2.0 user’s guide. Institut für Mikroelektronik, http://www.iue.tuwien.ac.at/software, Technische Universität Wien, Austria (2006)
VSP1.0: Vienna Schrödinger-Poisson solver 1.0 user’s guide. Institut für Mikroelektronik, http://www.iue.tuwien.ac.at/software, Technische Universität Wien, Austria (2007)
Wagner, M., Karner, M., Grasser, T.: Quantum correction model for modern semiconductor devices. In: Proc. of the XIII Intl. Workshop Semiconductor Devices, pp. 458–459 (2005)
Walls, T.J., Sverdlov, V.A., Likharev, K.K.: Nanoscale SOI MOSFETs: A comparison of two options. Solid State Electron. 48, 857–865 (2004)
Wang, E., Matagne, P., Shifren, L., Obradovic, B., Kotlyar, R., Cea, S., Stettler, M., Giles, M.D.: Physics of hole transport in strained silicon MOSFET inversion layers. IEEE Trans. Electron Devices 53(8), 1840–1851 (2006)
Wang, J., Polizzi, E., Ghosh, A., Datta, S., Lundstrom, M.: Theoretical investigation of surface roughness scattering in silicon nanowire transistor. J. Appl. Phys. 87, 0431,011–0431,013 (2005)
Wang, J., Polizzi, E., Lundstrom, M.: A three-dimensional quantum simulation of silicon nanowire transistors with the effective-mass approximation. J. Appl. Phys. 96(4), 2192–2203 (2004)
Wang, J., Rahman, A., Ghosh, A., Klimeck, G., Lundstrom, M.: On the validity of the parabolic effective-mass approximation for the i−v calculation of silicon nanowire transistors. IEEE Trans. Electron Devices 52(7), 1589–1595 (2005)
Welser, J., Hoyt, J., Gibbons, J.: NMOS and PMOS transistors fabricated in strained silicon/relaxed silicon-germanium structures. In: Intl. Electron Devices Meeting, pp. 1000–1002 (1992)
Wigner, E.: On the Quantum Correction for Thermodynamic Equilibrium. Phys. Rev. 40, 749–759 (1932)
Yoder, P., Higman, J., Bude, J., Hess, K.: Monte Carlo simulation of hot electron transport in Si using a unified pseudopotential description of the crystal. Semicond. Sci. Technol. 7(3B), 357–359 (1992)
Zahid, F., Ghosh, A., Paulsson, M., Polizzi, E., Datta, S.: Charging-induced asymmetry in molecular conductors. Phys. Rev. B 70, 245,317 (2004)
Author information
Authors and Affiliations
Corresponding author
Rights and permissions
Copyright information
© 2011 Springer-Verlag/Wien
About this chapter
Cite this chapter
Sverdlov, V. (2011). Demands of Transport Modeling in Advanced MOSFETs. In: Strain-Induced Effects in Advanced MOSFETs. Computational Microelectronics. Springer, Vienna. https://doi.org/10.1007/978-3-7091-0382-1_12
Download citation
DOI: https://doi.org/10.1007/978-3-7091-0382-1_12
Published:
Publisher Name: Springer, Vienna
Print ISBN: 978-3-7091-0381-4
Online ISBN: 978-3-7091-0382-1
eBook Packages: EngineeringEngineering (R0)