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The Influence of Ion Implantation Upon the High Temperature Oxidation of Titanium and Stainless Steel

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Ion Implantation in Semiconductors and Other Materials

Part of the book series: The IBM Research Symposia Series ((IRSS))

Abstract

The purpose of this work was to investigate the effects of the implantation of various metal species upon the high temperature oxidation of polycrystalline titanium and stainless steel. Oxidation was sometimes enhanced, and sometimes inhibited, to an extent correlated with the electronegativity of the implanted atoms, and increasing with ion dose. The effects were opposite in the two target materials chosen: tentative explantations are proposed.

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© 1973 Plenum Press, New York

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Dearnaley, G., Goode, P.D., Miller, W.S., Turner, J.F. (1973). The Influence of Ion Implantation Upon the High Temperature Oxidation of Titanium and Stainless Steel. In: Crowder, B.L. (eds) Ion Implantation in Semiconductors and Other Materials. The IBM Research Symposia Series. Springer, Boston, MA. https://doi.org/10.1007/978-1-4684-2064-7_35

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  • DOI: https://doi.org/10.1007/978-1-4684-2064-7_35

  • Publisher Name: Springer, Boston, MA

  • Print ISBN: 978-1-4684-2066-1

  • Online ISBN: 978-1-4684-2064-7

  • eBook Packages: Springer Book Archive

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