Abstract
Particle deposition velocity is the name given the coefficient relating particle buildup on a silicon wafer surface to the aerosol particle concentration adjacent to that surface. This paper reviews methods of measuring: (1) aerosol particle concentration and (2) surface particle areal density. High flow rate (1 cfm) optical particle counters are most suitable for clean room aerosol measurements, and laser scanners can detect surface particles as small as 0.2 to 0.3 µm, although the optical properties of the surface on which the particles rest play an important role in the detection. The aerosol particle measurement can be easily extended to 0.01 to 0.02 µm; no practical instrumentation yet exists for measuring ultrafine (<0.1 µm) surface particles.
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© 1988 Plenum Press, New York
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Donovan, R.P., Locke, B.R., Ensor, D.S. (1988). Measuring Aerosol Particle Concentration in Clean Rooms and Particle areal Density on Silicon Wafer Surfaces. In: Mittal, K.L. (eds) Particles on Surfaces 1. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-9531-1_4
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DOI: https://doi.org/10.1007/978-1-4615-9531-1_4
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