Abstract
The efficiency of all known cleaning methods drastically decreases when particles smaller than about 1 µm are to be removed from a solid substrate. In this paper it is shown both theoretically and experimentally that the passage of a liquid-gas phase boundary along the substrate may result in particle removal. It appears that under properly chosen wetting conditions of the particles and the substrate, the adhe rence of the particles to the liquid-gas phase boundary is stronger than their adherence to the substrate. Contrary to all other cleaning methods, the efficiency of particle removal by moving phase boundaries is in theory independent of the particle size. Kinetic factors, which are not considered in this theoretical analysis, appear to play an important role.
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
Preview
Unable to display preview. Download preview PDF.
References
A.V. Ferris-Prabhu in “Surface Contamination : Genesis, Detection and Control”, K.L. Mittal, Ed., Vol. 2, p.925, Plenum Press, New York, 1979.
K. Oshige and T. Kawamata in “Proc. of the 6th Intern. Symp. Contamination Control”, Tokyo, 1982, pp. 223–228.
I.F. Stowers and H.G. Patton in “Surface Contamination : Genesis, Detection and Control”, K.L. Mittal, Ed., Vol. 1, p.341, Plenum Press, New York, 1979.
I.F. Stowers, J. Vac. Sci. Technol. 15, 751 (1978).
S. ohwartzman, A. Mayer and W. Kern, RCA Review 46, 81 (1985).
J. Visser in “Surface and Colloid Science”, E. Matijevic, Ed., Vol. 8, p.3, J. Wiley &Sons, New York, 1976.
A.D. Zimon, “Adhesion of Dust and Powder”,2nd. edition, Plenum Press, New York, 1982.
J. Visser, Ph.D. thesis, Council for National Academic Awards, London, 1973.
H.M. Princen in “Surface and Colloid Science”, E. Matijevic, Ed., Vol. 2, p.1, J. Wiley &Sons, New York, 1969.
H.J. Schulze in “Developments in Mineral Processing”, Vol. 4, D.W. Fuerstenau, Ed., Elsevier, Amsterdam, 1984.
J.Th.G. Overbeek, Powder Technology, 37, 195 (1984).
M. van den Tempel, Adv. Colloid Interface Sci. 3, 137 (1972).
A.C. Zettlemoyer, J. Colloid Interface Sci. 28, 343 (1968).
C.J. Klomp and G.W. van Oosterhout, U.S. Patent 3,288,563 (1966).
W. Stöber, A. Fink and E. Bohn, J. Colloid Interface Sci. 26, 62 (1968).
A.W. Adamson, “Physical Chemistry of Surfaces”,3rd edition, J. Wiley &Sons, New York, 1976.
Author information
Authors and Affiliations
Editor information
Editors and Affiliations
Rights and permissions
Copyright information
© 1988 Plenum Press, New York
About this chapter
Cite this chapter
Leenaars, A.F.M. (1988). A New Approach to the Removal of Sub-Micron Particles from Solid (Silicon) Substrates. In: Mittal, K.L. (eds) Particles on Surfaces 1. Springer, Boston, MA. https://doi.org/10.1007/978-1-4615-9531-1_28
Download citation
DOI: https://doi.org/10.1007/978-1-4615-9531-1_28
Publisher Name: Springer, Boston, MA
Print ISBN: 978-1-4615-9533-5
Online ISBN: 978-1-4615-9531-1
eBook Packages: Springer Book Archive