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CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials

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High Dielectric Constant Materials

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Authors
  1. L. Colombo
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  2. A.L.P. Rotondaro
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  3. M.R. Visokay
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  4. J.J. Chambers
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    D.C. Gilmer

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Colombo, L., Rotondaro, A., Visokay, M., Chambers, J. (2005). CMOS IC Fabrication Issues for High-k Gate Dielectric and Alternate Electrode Materials. In: Huff, H., Gilmer, D. (eds) High Dielectric Constant Materials. Springer Series in Advanced Microelectronics, vol 16. Springer, Berlin, Heidelberg. https://doi.org/10.1007/3-540-26462-0_15

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