Matching Properties of Deep Sub-Micron MOS Transistors

  • Jeroen A. Croon
  • Willy Sansen
  • Herman E. Maes

Part of the The Kluwer International Series in Engineering and Computer Science book series (SECS, volume 851)

About this book

Introduction

Matching Properties of Deep Sub-Micron MOS Transistors examines this interesting phenomenon. Microscopic fluctuations cause stochastic parameter fluctuations that affect the accuracy of the MOSFET. For analog circuits this determines the trade-off between speed, power, accuracy and yield. Furthermore, due to the down-scaling of device dimensions, transistor mismatch has an increasing impact on digital circuits. The matching properties of MOSFETs are studied at several levels of abstraction:

A simple and physics-based model is presented that accurately describes the mismatch in the drain current. The model is illustrated by dimensioning the unit current cell of a current-steering D/A converter.

The most commonly used methods to extract the matching properties of a technology are bench-marked with respect to model accuracy, measurement accuracy and speed, and physical contents of the extracted parameters.

The physical origins of microscopic fluctuations and how they affect MOSFET operation are investigated. This leads to a refinement of the generally applied 1/area law. In addition, the analysis of simple transistor models highlights the physical mechanisms that dominate the fluctuations in the drain current and transconductance.

The impact of process parameters on the matching properties is discussed.

The impact of gate line-edge roughness is investigated, which is considered to be one of the roadblocks to the further down-scaling of the MOS transistor.

Matching Properties of Deep Sub-Micron MOS Transistors is aimed at device physicists, characterization engineers, technology designers, circuit designers, or anybody else interested in the stochastic properties of the MOSFET.

Keywords

CMOS Leistungsfeldeffekttransistor MOSFET matching MOSFET modeling Transistor device characterization field-effect transistor line-edge roughness metal oxide semiconductur field-effect transistor parameter fluctuations zitter

Authors and affiliations

  • Jeroen A. Croon
    • 1
  • Willy Sansen
    • 2
  • Herman E. Maes
    • 1
    • 2
  1. 1.IMECLeuvenBelgium
  2. 2.Katholieke Universiteit LeuvenLeuvenBelgium

Bibliographic information

  • DOI https://doi.org/10.1007/b105122
  • Copyright Information Springer 2005
  • Publisher Name Springer, Boston, MA
  • eBook Packages Engineering
  • Print ISBN 978-0-387-24314-6
  • Online ISBN 978-0-387-24313-9
  • Series Print ISSN 0893-3405
  • About this book
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