Modeling the emission red-shift in amorphous semiconductors and in organic-inorganic hybrids using extended multiple trapping

Solid and Condensed State Physics


A model of thermal relaxation within localized states based on the extended multiple trapping framework is used to describe the red-shift of the emission maximum intensity as the excitation energy decreases. The model is applied to amorphous hydrogenated silicon (a-Si:H) and to organic-inorganic hybrids systems giving values for the energy gap, E0, (1.896–3.882 eV) and for the β (4.36–12.08 eV-1) parameter that characterizes the experimental decay of the density of localized states within the gap consistent with those achieved by some other recombination models previously reported for a-Si:H.. The thermal relaxation within localized states model is more physically detailed incorporating radiative and non-radiative transition mechanism for carriers relaxing into localized states that are explicitly absent in the previously reported theoretical descriptions


78.55.Qr Amorphous materials; glasses and other disordered solids 81.05.Gc Amorphous semiconductors 81.07.Pr Organic-inorganic hybrid nanostructures 


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Copyright information

© EDP Sciences/Società Italiana di Fisica/Springer-Verlag 2006

Authors and Affiliations

  • R. A. Sá Ferreira
    • 1
    • 2
  • A. L. Ferreira
    • 1
  • L. D. Carlos
    • 1
    • 2
  1. 1.Departamento de FísicaUniversidade de AveiroAveiroPortugal
  2. 2.CICECO, Universidade de AveiroAveiroPortugal

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