Abstract
Indium tin oxide (ITO) thin films are the important component in display and semiconductor industries because of their excellent electrical and optical properties. To improve the reliability and performance of these films, the surface shape and thickness should be measured accurately. In this research, the surface topography of an ITO thin film on the surface of a supporting plate was measured by wavelength tuned phase shifting interferometer and polynomial window function. The surface topography is measured by compensating for the phase difference error caused by interference of the transparent thin film. Optical interference is formulated by the phase and amplitudes determined by wavelength tuning and polynomial window function. The measurement method allows for noncontact (nondestructive), large aperture, and nanoscale measurement of highly reflective thin films.
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18 July 2018
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09 August 2018
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Recommended by Associate Editor Haseung Chung
Yangjin Kim obtained his B.S. and Ph.D. degrees at the Department of Mechanical Engineering, The University of Tokyo, Japan, in 2007 and 2015, respectively. Dr. Kim was the researcher of Korea Institute of Machinery and Materials from 2009 to 2012. Dr. Kim is currently an Assistant Professor at the School of Mechanical Engineering, Pusan National University. His research interests include precision measurement, wavelength tuning interferometry, fringe analysis using phase shifting, and structural/thermal analysis of machine tools.
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Kim, Y. Precision interferometric surface metrology of transparent thin film using wavelength tuning. J Mech Sci Technol 31, 5423–5428 (2017). https://doi.org/10.1007/s12206-017-1037-9
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DOI: https://doi.org/10.1007/s12206-017-1037-9