Abstract
Diffuse scattering caused by L12 type Ni3 (Al, Si) precipitates after stress annealing of Ni-Al-Si alloys is studied. Peculiarities of diffuse scattering in the asymptotic region as compared to the Huang scattering region are discussed. Coupling between the stress annealing direction and the precipitate shape is demonstrated. Experimental reciprocal space maps (RSMs) are compared to theoretical ones. Oscillations of diffuse scattering due to Ni3 (Al, Sc) precipitates are observed. The strengths of the precipitates are estimated from the analysis of the diffuse scattering oscillations.
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Acknowledgments
Research supported by the Materials Sciences and Engineering Division, Office of Basic Energy Sciences, United States Department of Energy. X-ray microbeam measurements were performed at 33-ID at the Advanced Photon Source (APS). The use of the APS was supported by the Scientific Users Facilities Division, Office of Basic Energy Sciences, United States Department of Energy.
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Manuscript submitted March 21, 2011.
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Barabash, R.I., Ice, G.E., Karapetrova, E.A. et al. Stress Annealing Induced Diffuse Scattering from Ni3 (Al, Si) Precipitates. Metall Mater Trans A 43, 1413–1422 (2012). https://doi.org/10.1007/s11661-011-0937-z
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DOI: https://doi.org/10.1007/s11661-011-0937-z