Plasma Chemistry and Plasma Processing

, Volume 36, Issue 2, pp 523–534 | Cite as

Yields of Hydrogen and Hydrogen Peroxide from Argon–Water Vapor in Dielectric Barrier Discharge

Original Paper


Controlled chemical transformation of water vapor in dielectric barrier discharge (DBD) of argon into hydrogen and hydrogen peroxide for its usability as in situ or ex situ H2 and H2O2 source are reported. Online analysis of the product gas mixture by conventional wet-chemical colorimetric method using buffered KI absorber solution revealed typical H2O2 G-value = 6.4 × 10−3 µmol J−1 (G-value defines as the number of molecules produced/consumed per 100 eV of energy; in SI unit G-value is expressed in µmol J−1) in the absence of ozone. On the other hand, H2 in product mixture analyzed in gas chromatograph-thermal conductivity detector (GC-TCD) with argon carrier revealed its G-value = 0.134 µmol J−1. Enhancements in products’ yields were explored by varying gas residence time inside the plasma zone, and applied voltage and frequency on the dielectric surfaces. Employing a double-DBD reactor, at applied high voltage ~2.5 kV mm−1 @50 Hz and gas residence time ~20 s resulted in the highest yields of H2O2. However, the H2 yield increased continuously with increase in gas residence time. On the other hand, the single-dielectric barrier surface reactors were more efficient for high and exclusive generation of ex situ H2 (e.g. maximum 1260 ppm; G-value typically 0.498 µmol J−1).


Dielectric barrier discharge Argon Water vapor Hydrogen Hydrogen peroxide Free radical reactions Gas chromatograph 



This research was carried out under the plan Project No: XII-N-R&D-02.1. Authors thank the Department of Atomic Energy, Government of India and Bhabha Atomic Research Centre for funds, and all members of Radiation & Photochemistry Division for their support.

Supplementary material

11090_2015_9675_MOESM1_ESM.doc (36 kb)
Supplementary material 1 (doc 36 kb)


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Copyright information

© Springer Science+Business Media New York 2015

Authors and Affiliations

  1. 1.Radiation and Photochemistry DivisionBhabha Atomic Research CentreTrombay, MumbaiIndia

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