Abstract
Remarkable properties of plasma polymer films are greatly dependent not only on the chemical structure of precursor but also on the reactor design and the deposition conditions. In many industrial applications it is a challenge to control the plasma polymer structure. In this paper we investigate the chemical transformation of various aromatic compounds, such as activation and fragmentation of substituent-part, aromatic ring opening, during plasma polymerization process. Polymerized films are deposited in a low-frequency capacitively coupled plasma-enhanced chemical vapour deposition reactor, working at low pressure. The chemical composition of plasma-polymerized films is elucidated by Fourier-transform infrared spectroscopy, solid-state carbon-13 nuclear magnetic resonance spectroscopy, and X-ray photoelectron spectroscopy. Based on spectroscopic measurements, the intermediary reactions during film growth may be presumed.
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Acknowledgments
Philippe Gaveau, Marius Dobromir and Romain Coustel are gratefully acknowledged for their valuable help in 13C-NMR, XPS and SEM analyses, respectively. This work was supported by European Union’s Seventh Framework Programme (Grant Agreement No. 264115-STREAM, call FP7-REGPOT-2010-1) and Romanian Space Agency (ROSA), project STAR CDI ID 349/2014-2016.
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Paper dedicated to the 65th anniversary of “Petru Poni” Institute of Macromolecular Chemistry of Romanian Academy, Iasi, Romania.
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Asandulesa, M., Topala, I., Legrand, YM. et al. Chemical Investigation on Various Aromatic Compounds Polymerization in Low Pressure Helium Plasma. Plasma Chem Plasma Process 34, 1219–1232 (2014). https://doi.org/10.1007/s11090-014-9555-z
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DOI: https://doi.org/10.1007/s11090-014-9555-z