Fig. 3
From: Vacuum Deposition
(a) A source-substrate configuration to estimate the flux of evaporated particles incident on ΔA from a small area source. Shown with dashed lines is the projected area of the corresponding area with respect to the line connecting the source opening and ΔA. (b) Normalized thickness profile as a function of θ for area and point sources. The former follows cos4θ and the latter follows cos3θ law. To be within 5% [10%] difference from the thickest spot (x = 0), x/h should be within 0.161 [0.233]