Definition
Ion beam machining (IBM) is an important nonconventional manufacturing technology used in micro-/nanofabrication, using a stream of accelerated ions by electrical means in a vacuum chamber to remove, add, or modify the atoms on the surface of the object. Mainly resulting from the energetic collision cascade, the ion beam removed or sputtered atoms from the workpiece by transferring sufficient ions’ energy and momentum to target atoms, and parts of the ions will finally implant into the substrate after losing energy (Machine Tool 2016; https://en.wikipedia.org/wiki/Ion_beam). IBM usually can be functional classified to ion sputtering/etching (remove material), ion sputter coating/ion-induced deposition (add material), and ion implantation (implant modification) (https://en.wikipedia.org/wiki/Ion_beam; Hellborg et al. 2009...
Access this chapter
Tax calculation will be finalised at checkout
Purchases are for personal use only
References
Allen DM, Shore P, Evans RW, Fanara C, O’Brien W, Marson S, O’Neill W (2009) Ion beam, focused ion beam, and plasma discharge machining. CIRP Ann Manuf Technol 58(2):647–662
Cui A, Li W, Shen TH, Yao Y, Fenton JC, Peng Y, Liu Z, Zhang J, Gu C (2013) Thermally induced shape modification of free-standing nanostructures for advanced functionalities. Sci Rep 3:2429
Fang F, Xu Z (2015) State-of-the-art for nanomanufacturing using ion beam technology. In: Handbook of manufacturing engineering and technology. Springer, London, pp 1279–1315
Fang FZ, Xu ZW, Hu XT, Wang CT, Luo XG, Fu YQ (2010) Nano-photomask fabrication using focused ion beam direct writing. CIRP Ann Manuf Technol 59(1):543–546
Fang FZ, Chen YH, Zhang XD, Hu XT, Zhang GX (2011) Nanometric cutting of single crystal silicon surfaces modified by ion implantation. CIRP Ann Manuf Technol 60(1):527–530
Hellborg R, Whitlow HJ, Zhang Y (2009) Ion beams in nanoscience and technology. Springer Science & Business Media, Heidelberg
Hrnčíř T, Lopour F, Zadražil M, Delobbe A, Salord O, Sudraud P (2012) Novel plasma FIB/SEM for high speed failure analysis and real time imaging of large volume removal. In: ISTFA: conference proceedings from the 38th international symposium for testing and failure analysis, 2012, p 26
Hu X, Xu Z, Li K, Fang F, Wang L (2015) Fabrication of a Au–polystyrene sphere substrate with three-dimensional nanofeatures for surface-enhanced Raman spectroscopy. Appl Surf Sci 355:1168–1174
Kempshall BW, Schwarz SM, Prenitzer BI, Giannuzzi LA, Irwin RB, Stevie FA (2001) Ion channeling effects on the focused ion beam milling of Cu. J Vac Sci Technol B 19(3):749–754
Lehtinen O, Kotakoski J, Krasheninnikov AV, Tolvanen A, Nordlund K, Keinonen J (2010) Effects of ion bombardment on a two-dimensional target: atomistic simulations of graphene irradiation. Phys Rev B 81(15):153401
Libertino S, La Magna A (2009) Damage formation and evolution in ion-implanted crystalline Si. In: Materials science with ion beams. Springer, Berlin/Heidelberg, pp 147–212
Machine Tool (2016) In Encyclopædia Britannica. Retrieved from https://www.britannica.com/technology/machine-tool/Electrical-discharge-machining-EDM
Melli M, Polyakov A, Gargas D, Huynh C, Scipioni L, Bao W, Weber-Bargioni A (2013) Reaching the theoretical resonance quality factor limit in coaxial plasmonic nanoresonators fabricated by helium ion lithography. Nano Lett 13(6):2687–2691
Reyntjens S, Puers R (2001) A review of focused ion beam applications in microsystem technology. J Micromech Microeng 11(4):287
Smith R, Harrison DE Jr, Garrison BJ (1989) keV particle bombardment of semiconductors: a molecular-dynamics simulation. Phys Rev B 40(1):93
Sun J, Luo X, Ritchie J, Hrncir T (2012) A predictive divergence compensation approach for the fabrication of three-dimensional microstructures using focused ion beam machining. Proc Inst Mech Eng B J Eng Manuf 226(2):229–238
Tong Z, Luo X (2015) Investigation of focused ion beam induced damage in single crystal diamond tools. Appl Surf Sci 347:727–735
Tseng AA (2004) Recent developments in micromilling using focused ion beam technology. J Micromech Microeng 14(4):R15
Volkert CA, Minor AM (2007) Focused ion beam microscopy and micromachining. MRS Bull 32(05):389–399
Xiao YJ, Fang FZ, Xu ZW, Hu XT (2015) Annealing recovery of nanoscale silicon surface damage caused by Ga focused ion beam. Appl Surf Sci 343:56–69
Xie X, Li S (2015) Ion beam figuring technology. In: Handbook of manufacturing engineering and technology. Springer, London, pp 1343–1390
Xu ZW, Fang FZ, Fu YQ, Zhang SJ, Han T, Li JM (2009) Fabrication of micro/nano-structures using focused ion beam implantation and XeF2 gas-assisted etching. J Micromech Microeng 19(5):054003
Xu ZW, Fang FZ, Zhang SJ, Zhang XD, Hu XT, Fu YQ, Li L (2010) Fabrication of micro DOE using micro tools shaped with focused ion beam. Opt Express 18(8):8025–8032
Xu Z, Fang F, Gao H, Zhu Y, Wu W, Weckenmann A (2012) Nano fabrication of star structure for precision metrology developed by focused ion beam direct writing. CIRP Ann Manuf Technol 61(1):511–514
Xu ZW, Fang F, Zeng G (2015) Focused ion beam nanofabrication technology. In: Handbook of manufacturing engineering and technology. Springer, London, pp 1391–1423
Ziegler JF (2004) SRIM-2003. Nucl Instrum Methods Phys Res, Sect B 219:1027–1036
Author information
Authors and Affiliations
Corresponding author
Editor information
Editors and Affiliations
Section Editor information
Rights and permissions
Copyright information
© 2019 CIRP
About this entry
Cite this entry
Fang, F., Xu, Z.W. (2019). Ion Beam Machining. In: Chatti, S., Laperrière, L., Reinhart, G., Tolio, T. (eds) CIRP Encyclopedia of Production Engineering. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-662-53120-4_6485
Download citation
DOI: https://doi.org/10.1007/978-3-662-53120-4_6485
Published:
Publisher Name: Springer, Berlin, Heidelberg
Print ISBN: 978-3-662-53119-8
Online ISBN: 978-3-662-53120-4
eBook Packages: EngineeringReference Module Computer Science and Engineering