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Chemical Vapor Deposition (CVD)

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CIRP Encyclopedia of Production Engineering

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Definition

Chemical vapor deposition (CVD) is a process whereby a solid material is deposited from the reaction of vapor-phase chemical reactants on or close to a substrate surface. The solid material is obtained as a coating, a powder, or single crystals. A reaction chamber is used for the process, into which the reactant gases are introduced to decompose and react. By varying the environmental conditions such as substrate material and temperature, composition of the reaction gas mixture, total pressure gas flows, etc., materials with different properties can be grown (Martin 2010).

Theory and Application

Process Description

Chemical vapor deposition (CVD) is a widely used materials-processing technology. It is a synthesis process capable of producing high-purity, high-performance solid materials through chemical reactions in vapor phase. CVD is commonly used to deposit conformal films to surfaces essential in the manufacture of semiconductors and other electronic components; in the...

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References

  • Choy K (2003) Chemical vapour deposition of coatings. Prog Mater Sci 48(2):57–170

    Article  Google Scholar 

  • Dobkin D, Zuraw M (2003) Principles of chemical vapor deposition. Kluwer, Dordrecht/Boston

    Book  Google Scholar 

  • Martin P (2010) Handbook of deposition technologies for films and coatings science, applications and technology. Elsevier, Amsterdam/Boston

    Google Scholar 

  • Park J-H, Sudarshan TS (2001) Chemical vapor deposition. ASM International, Materials Park

    Google Scholar 

  • Pierson H (1999) Handbook of chemical vapor deposition: principles, technology, and applications, 2nd edn. Noyes, Norwich

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  • Tracton A (2005) Coatings technology handbook. Taylor & Francis, Boca Raton

    Book  Google Scholar 

  • Yan X-T, Xu Y (2010) Chemical vapour deposition: an integrated engineering design for advanced materials. Springer, London

    Google Scholar 

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Author information

Authors and Affiliations

  1. KU Leuven – Campus De Nayer, Sint-Katelijne-Waver, Belgium

    Kurt Coppens

  2. Department of Mechanical Engineering, Production Engineering, Machine Design and Automation (PMA) Section, KU Leuven, Leuven, Belgium

    Eleonora Ferraris

Authors
  1. Kurt Coppens
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  2. Eleonora Ferraris
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Corresponding author

Correspondence to Eleonora Ferraris .

Section Editor information

  1. Institut für Transport- und Automatisierungstechnik, Gottfried Wilhelm Leibniz Universität Hannover, Garbsen, Deutschland

    Ludger Overmeyer

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© 2018 CIRP

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Coppens, K., Ferraris, E. (2018). Chemical Vapor Deposition (CVD). In: CIRP Encyclopedia of Production Engineering. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-642-35950-7_16770-1

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  • DOI: https://doi.org/10.1007/978-3-642-35950-7_16770-1

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  • Publisher Name: Springer, Berlin, Heidelberg

  • Print ISBN: 978-3-642-35950-7

  • Online ISBN: 978-3-642-35950-7

  • eBook Packages: Springer Reference EngineeringReference Module Computer Science and Engineering

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