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Surface and Interface Characterization

  • Reference work entry
Springer Handbook of Materials Measurement Methods

Part of the book series: Springer Handbooks ((SHB))

Abstract

While the bulk material properties treated in Part C of this Handbook are obviously important, the surface characteristics of materials are also of great significance. They are responsible for the appearances of materials and surface phenomena, and they have a crucial influence on the interactions of materials with gases or fluids (in corrosion for example, Chap. 12), contacting solids (as in friction and wear, Chap. 13) or biospecies (Chap. 14) and materials–environment interactions (Chap. 15). Surface and interface characterization have been important topics for very many years. Indeed, it was known in antiquity that impurities could be detrimental to the quality of metals, that keying and contamination were important to adhesion in architecture and also in the fine arts. In contemporary technologies, surface modification or functional coatings are frequently used to tailor the processing of advanced materials. Some components, such as quantum well devices and X-ray mirrors, are composed of multilayers with individual layer thicknesses in the low nanometer range. Quality assurance of industrial processes, as well as the development of advanced surface-modified or coated components, requires chemical information on material surfaces and (buried) interfaces with high sensitivity and high lateral and depth resolution. In this chapter we present the methods applicable to the chemical and physical characterization of surfaces and interfaces.

This chapter covers the three main techniques of surface chemical analysis: Auger electron spectroscopy (AES), X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS) are all still rapidly developing in instrumentation, standards and applications. AES is excellent for elemental analysis at spatial resolutions down to 10 nm, and XPS can define chemical states down to 10 μm. Both analyze the outermost atom layers and, with sputter depth profiling, layers up to 1 μm thick.

Dynamic SIMS incorporates depth profiling and can detect atomic compositions significantly below 1 ppm. Static SIMS retains this high sensitivity for the surface atomic or molecular layer but provides chemistry-related details not available with AES or XPS. New reference data, measurement standards and documentary standards from ISO will continue to be developed for surface chemical analysis over the coming years.

The chapter also discusses surface physical analysis (topography characterization), which encompasses measurement, visualization and quantification. This is critical to both component form and to surface finish at macro-, micro- and nanoscales. The principal methods of surface topography measurement are stylus profilometry, optical scanning techniques, and scanning probe microscopy (SPM). These methods, based on acquiring topography data from point-by-point scans, give quantitative information on surface height with respect to position. The integral methods, which are based on a different approach, produce parameters that represent some average property of the surface under examination. Measurement methods, as well as their application and limitations, are briefly reviewed, including standardization and traceability issues.

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Abbreviations

µTA:

microthermal analysis

AA:

arithmetic average

AES:

Auger electron spectroscopy

AFM:

atomic force microscopy

ASTM:

American Society for Testing and Materials

CCD:

digitized with charge-coupled device

CLA:

center line average

CRM:

certified reference material

DC:

direct-current

DFT:

density functional theory

DFT:

discrete Fourier transform

EPMA:

electron probe microanalysis

FDA:

frequency domain analysis

HPLC:

high-performance liquid chromatography

ISO:

International Organization for Standardization

NIST:

National Institute of Standards and Technology

PC:

photoconductive

PEELS:

parallel electron energy loss spectroscopy

PTFE:

polytetrafluoroethylene

PVC:

polyvinyl chloride

RMS:

root mean square

RSF:

relative sensitivity factor

SEM:

scanning electron microscope

SNOM:

scanning near-field optical microscopy

STM:

scanning tunneling microscopes

TEM:

transmission electron microscope

TOF:

time-of-flight

XPS:

X-ray photoelectron spectroscopy

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Authors and Affiliations

  1. Quality of Life Division, National Physical Laboratory, Hampton Road, Middlesex, TW11 0LW, Teddington, UK

    Martin Seah Dr.

  2. Department of Manufacturing Engineering and Management, Technical University of Denmark, Produktionstorvet, Building 425, 2800, Kgs. Lyngby, Denmark

    Leonardo Chiffre Prof.

Authors
  1. Martin Seah Dr.
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  2. Leonardo Chiffre Prof.
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Correspondence to Martin Seah Dr. or Leonardo Chiffre Prof. .

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Editors and Affiliations

  1. Department of Electrical Engineering and Precision Engineering, University of Applied Sciences, TFH Berlin, Luxemburger Strasse 10, 13353, Berlin, Germany

    Horst Czichos Prof.

  2. National Institute for Materials Science (NIMS), Tsukuba, Ibaraki, Japan

    Tetsuya Saito

  3. National Institute of Standards and Technology (NIST), Gaithersburg, MD, US

    Leslie Smith

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© 2006 Springer-Verlag

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Seah, M., Chiffre, L. (2006). Surface and Interface Characterization. In: Czichos, H., Saito, T., Smith, L. (eds) Springer Handbook of Materials Measurement Methods. Springer Handbooks. Springer, Berlin, Heidelberg. https://doi.org/10.1007/978-3-540-30300-8_6

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