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Handbook of Laser Micro- and Nano-Engineering pp 1–40Cite as

Extraordinary Young’s Interferences and Super-Diffraction Laser Lithography

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Abstract

As a low-cost, high-efficient, and large-area nanofabrication approach, optical lithography has attracted a great deal of interests and shows promising applications in integrated circuit manufacturing. However, the diffraction limit of light leads to the resolution improvement of optical lithography relying on the shrinking wavelength of exposure source, which is hard to be maintained. Inspired by the extraordinary Young’s interference, the short wavelength property of M-wave, a special surface wave confined at the surface of structured materials, is discovered, which offers a potential way to surpass the traditional diffraction limit. During the past years, researchers have proposed a variety of plasmonic lithography methods in the manner of interference and imaging and have demonstrated that sub-diffraction resolution could be achieved by theoretical simulations or experiments. This chapter will give a review and some discussion about the advances in this realm.

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Authors and Affiliations

  1. State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu, China

    Xiangang Luo

Authors
  1. Xiangang Luo
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Correspondence to Xiangang Luo .

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Editors and Affiliations

  1. RIKEN-SIOM Joint Research Unit, RIKEN Center for Advanced Photonics RIKEN-SIOM Joint Research Unit, Wako, Saitama, Japan

    Koji Sugioka

Section Editor information

  1. Dept. of Electrical & Computer Engineering, National University of Singapore, Singapore, Singapore

    Minghui Hong

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Luo, X. (2020). Extraordinary Young’s Interferences and Super-Diffraction Laser Lithography. In: Sugioka, K. (eds) Handbook of Laser Micro- and Nano-Engineering. Springer, Cham. https://doi.org/10.1007/978-3-319-69537-2_42-1

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  • DOI: https://doi.org/10.1007/978-3-319-69537-2_42-1

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  • Publisher Name: Springer, Cham

  • Print ISBN: 978-3-319-69537-2

  • Online ISBN: 978-3-319-69537-2

  • eBook Packages: Springer Reference Physics and AstronomyReference Module Physical and Materials ScienceReference Module Chemistry, Materials and Physics

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