Abstract
Photolithography as it relates to lithography fundamentals is described and applied to the lithography process utilized in producing integrated circuits (ICs) and layered electronic device structures. These structures have some thickness or layering restrictions but are nonetheless layer-manufactured structures on an electronic landscape, usually a silicon wafer substrate.
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References
Baker RJ (2010) CMOS: circuit design, layout, and simulation, 3rd edn. Wiley/IEEE, New York
Maly W (1987) Atlas of IC technologies: an introduction to VLSI processes. Benjamin/Cummings, Menlo Park
Meade CA, Conway L (1980) Introduction to VLSI systems. Addison-Wesley, Boston
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© 2015 Springer International Publishing Switzerland
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Murr, L.E. (2015). Photolithography Applied to Integrated Circuit (IC) Microfabrication. In: Handbook of Materials Structures, Properties, Processing and Performance. Springer, Cham. https://doi.org/10.1007/978-3-319-01815-7_34
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DOI: https://doi.org/10.1007/978-3-319-01815-7_34
Publisher Name: Springer, Cham
Print ISBN: 978-3-319-01814-0
Online ISBN: 978-3-319-01815-7
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