Encyclopedia of Systems and Control

Living Edition
| Editors: John Baillieul, Tariq Samad

Run-to-Run Control in Semiconductor Manufacturing

Living reference work entry
DOI: https://doi.org/10.1007/978-1-4471-5102-9_255-1

Abstract

Run-to-run (R2R) control is a form of adaptive model-based process control that can be tailored to environments where the process is discrete, dynamic, and highly unobservable; this is characteristic of processes in the semiconductor manufacturing industry. It generally has, at its roots, a rather straightforward approach to adaptive model-based control such as a first-order linear plant model with moving average weighting applied to adapt the (zeroth-order) constant term in the model. Most of the complexity of R2R control science lies and will continue to lie in extensions to support practical application of R2R control in semiconductor manufacturing facilities of the future; these extensions include support for weighting and bounding of parameters, run-time modeling of a large number of disturbance types, and incorporating prediction information such as virtual metrology and yield prediction into the control solution.

Keywords

Run-to-run control R2R control Advanced Process Control (APC) Wafer-to-wafer control Model-based control EWMA control Adaptive control Single-threaded control Virtual metrology Yield prediction Feed-forward and feedback control 
This is a preview of subscription content, log in to check access.

Bibliography

  1. Advanced Process Control (APC) Conference Proceedings (2000–2014), titles available at http://www.apcconference.com
  2. Box GEP, Draper NR (1987) Empirical model-building and response surfaces. Wiley, New YorkMATHGoogle Scholar
  3. Cheng F-T etal. (2011) Benefit model of virtual metrology and integrating AVM Into MES. IEEE Trans Semicond Manuf 24(2):261–272Google Scholar
  4. Edgar TF, Firth SK, Bode C (2004) Multi-product run-to-run control for high-mix fabs. (session keynote) AEC/APC Asia, Hsinchu, (2004), (available at http://140.113.156.45/files/reference/2nd%20AEC-APC%20Symposium%20Asia/APCAEC/presentations/session_KeynoteInvited/Edgar_Thomas.pdf)
  5. International Technology Roadmap for Semiconductors (ITRS), 2014 Edition, Semiconductor Industry Association. Available at http://www.itrs.net. (See especially “Factory Integration” chapter)
  6. Khan A, Moyne J, Tilbury D (2007) Fab-wide control utilizing virtual metrology (invited). IEEE Trans Semicond Manuf-Spec Issue on Adv Process Control 20(7):364–375CrossRefGoogle Scholar
  7. Moyne J (2004) The evolution of APC: the move to total factory control (invited). Solid State Technol 47(9):47–52Google Scholar
  8. Moyne J (2009) A blueprint for enterprise-wide deployment of advanced process control. Solid State Technol 52(7):35–37Google Scholar
  9. Moyne J, Del Castillo E, Hurwitz A (2000) Run-to-run control in semiconductor manufacturing. CRC, Boca RatonCrossRefGoogle Scholar
  10. Moyne J, Schulze B (2010) Yield management enhanced advanced process control system (YMeAPC): part I, description and case study of feedback for optimized multi-process control. IEEE Trans Semicond Manuf Spec Issue Adv Process Control 23(2):221–235CrossRefGoogle Scholar
  11. Zou J (2013) Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility. United States Patent, Patent Number US 8,355,810 B2 (Filed, Jan 2010; Issued, Jan 2013)Google Scholar

Copyright information

© Springer-Verlag London 2014

Authors and Affiliations

  1. 1.Mechanical Engineering DepartmentUniversity of MichiganMIUSA