• Jian Chen
  • Qiwen ZhanEmail author
Reference work entry


Over the past few decades, ellipsometry has become an important and widely used optical metrology tool in scientific research and industrial manufacturing due to its nondestructive nature and inherent simplicity. There have been increasing needs to extend the capabilities of ellipsometry to spatially resolve materials and structures with micro- and nanoscale features. In this chapter, the basic principle of ellipsometry will be reviewed, and two microellipsometry techniques that employ high numerical aperture (NA) objective lens capable of characterizing structures and materials with high spatial resolution are presented. The use of high NA lens collects more oblique rays to increase the ellipsometric signal while providing high spatial resolution of these techniques for spatially resolved characterization tasks. The working principles and experimental setups in each case are discussed mathematically and demonstrated schematically, respectively. Applications of these techniques to characterize patterned surface structures, unresolved surface features, residual axial birefringence, and micro-optical components are subsequently summarized. Finally, taking advantage of the recent rapid developments in vector optical fields, rapid polarimetric measurement techniques utilizing parallel polarization measurement that can extract the entire polarization information from the sample with a single intensity snapshot will be described.


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Copyright information

© Springer Nature Switzerland AG 2019

Authors and Affiliations

  1. 1.School of Optical-Electrical and Computer EngineeringUniversity of Shanghai for Science and TechnologyShanghaiChina
  2. 2.Department of Electro-Optics and PhotonicsUniversity of DaytonDaytonUSA

Section editors and affiliations

  • Ida Nathan
    • 1
  • Norbert Meyendorf
    • 2
  1. 1.Department of Electrical and Computer EngineeringUniversity of AkronAkronUSA
  2. 2.Center for Nondestructive EvaluationIowa State UniversityAmesUSA

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