Volume 1, Issue 4 | MRS Advances

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Volume 1, Issue 4

January 2016

Electronics and Photonics

10 articles in this issue

Electrically Coupling Multifunctional Oxides to Semiconductors: A Route to Novel Material Functionalities
J. H. Ngai
K. Ahmadi-Majlan
D. Su
OriginalPaper 04 February 2016 Pages: 255 - 263
Impact of glycerol on Zinc Oxide based thin film transistors with Indium Molybdenum Oxide electrodes
Mateusz Tomasz Mądzik
Elangovan Elamurugu
Jaime Viegas
OriginalPaper 13 January 2016 Pages: 265 - 268
Higher-k Tetragonal Phase Stabilization in Atomic Layer Deposited Hf_1-xZr_xO₂ (0<x<1) Thin Films on Al₂O₃ Passivated Epitaxial-Ge
Sonal Dey
Kandabara Tapily
Alain C. Diebold
OriginalPaper 26 January 2016 Pages: 269 - 274
Memristive behavior in BaTiO₃/La_0.7Sr_0.3MnO₃ heterostructures integrated with semiconductors
Srinivasa Rao Singamaneni
John Prater
Jay Narayan
OriginalPaper 26 January 2016 Pages: 275 - 280
Thin-film transistors based on Zinc Oxide channel layer and Molybdenum doped Indium Oxide transparent electrodes
Mateusz Tomasz Mądzik
Elangovan Elamurugu
Jaime Viegas
OriginalPaper 26 January 2016 Pages: 281 - 285
Integrating 2D electron gas oxide heterostructures on silicon using rare-earth titanates
Eric N. Jin
Lior Kornblum
Frederick J. Walker
OriginalPaper 02 February 2016 Pages: 287 - 292
Effect of UV Laser Irradiation on the properties of NiO films and ZnO/NiO Heterostructures
Srikanth Itapu
Kamruzzaman Khan
Daniel G. Georgiev
OriginalPaper 03 February 2016 Pages: 293 - 298
Pulsed-Metal Organic Chemical Vapor Deposition (PMOCVD) for Growth of Single Phase Wurtzite Mg_xZn_1-xO Epitaxial Film with High Mg Content (x=0.51)
Fikadu Alema
Oleg Ledyaev
Winston V. Schoenfeld
OriginalPaper 15 February 2016 Pages: 299 - 304
All inorganic quantum dot light emitting devices with solution processed metal oxide transport layers
R. Vasan
H. Salman
M. O. Manasreh
OriginalPaper 15 February 2016 Pages: 305 - 310
Part of 1 collection:

Quantum Materials
Growth of HfSi_xO_y/ HfO₂ Thin Film on Si Substrate by Microwave Generated Remote Plasma Assisted Atomic Layer Deposition Techniques
Hiroki Ishizaki
OriginalPaper 22 February 2016 Pages: 311 - 316