MRS Advances - Volume 7 Editorial Board
Volume 7 Editors
Editor in Chief
David F. Bahr, Purdue University, USA
Edited by
Editorial Board
Viktoriia Babicheva, University of New Mexico, USA
Susana Diaz-Amaya, Bayer, USA
Meenakshi Dutt, Rutgers University, USA
Nicholas Glavin, Air Force Research Lab, USA
Norbert Huber, Helmholtz-Zentrum Hereon, Germany
Javier Illescas, Instituto Tecnológico de Toluca, Mexico
Praveen Kumar, Indian Institute of Science, India
Ruth Schwaiger, Forschungszentrum Jülich, Germany
Volume 7 | Principal Editors
Robert Abbel, New Zealand Forest Research Institute (Scion), New Zealand
Björn Alling, Linköping University, Sweden
Jean-Charles Arnault, Commissariat à l'énergie atomique et aux énergies alternatives (CEA), France
Mario Caironi, Istituto Italiano di Tecnologia, Italy
Artur Davoyan, University of California, Los Angeles, USA
Chiara Ghezzi, UMass Lowell, USA
Krzysztof Gofryk, Idaho National Laboratory, USA
Ivan Gordon, imec, Belgium
Seung Min Han, Korea Advanced Institute of Science and Technology, South Korea
Anna Isaeva, The University of Amsterdam, The Netherlands
Hyunhyub Ko, Ulsan National Institute of Science and Technology, South Korea
N. M. Anoop Krishnan, Indian Institute of Technology Delhi, India
Christian Leinenbach, Empa-Swiss Federal Laboratories for Materials Science and Technology, Switzerland
Shangchao Lin, Shanghai Jiao Tong University, China
Yuzi Liu, Argonne National Laboratory, USA
Christine Luscombe, University of Washington, USA
Veruska Malavé, National Institute of Standards and Technology, USA
Zebing Mao, Shibaura Institute of Technology, Japan
Alex Martinson, Argonne National Laboratory, USA
John McCloy, Washington State University, USA
Thompson Mefford, Clemson University, USA
Shashank Misra, Sandia National Laboratories, USA
Kevin Musselman, University of Waterloo, Canada
Tianxiang Nan, Tsinghua University, China
Roger Narayan, North Carolina State University, USA
Marc in het Panhuis, University of Wollongong, Australia
Eun Soo Park, Seoul National University, South Korea
Junghyun Park, Samsung Electronics, USA
Yuyan Shao, Pacific Northwest National Laboratory, USA
Radwanul Hasan Siddique, Samsung Electronics America, USA
Fernando Sigoli, The University of Campinas, Brazil
Giulia Tagliabue, EPFL, Switzerland
Jeremy Theil, Mountain View Energy, USA
Fumiyoshi Tochikubo, Tokyo Metropolitan University, Japan
Rama Vasudevan, Oak Ridge National Laboratory, USA
Claire Villevieille, Laboratoire d'Electrochimie et Physicochimie des Matériaux et des Interfaces, France
Hui Wang, University of Louisville, USA
Oliver Williams, Cardiff University, UK
Thierry Wiss, European Commission Joint Research Centre, Germany
Annie Xian Zhang, Stevens Institute of Technology, USA
Huichan Zhao, Tsinghua University, China
Yangying Zhu, University of California, Santa Barbara, USA
Volume 7 | Scientific Basis for Nuclear Waste Management XLV
Stefan Neumeier, Forschungszentrum Jülich, Germany
Volume 7 | IMRC 2022
Oswaldo Burciaga Díaz, Instituto Tecnológico de Saltillo, Mexico
Epifanio Cruz, Universidad Nacional Autonoma de Mexico, Mexico
Jose M Herrera-Ramirez, Centro de Investigación en Materiales Avanzados (CIMAV), Mexico
Javier Illescas, Instituto Tecnológico de Toluca, Mexico
N M Anoop Krishnan, Indian Institute of Technology-Delhi, India
Carlos A. León Patiño, Universidad Michoacana, Mexico
Eddie Lopez-Honorato, Oak Ridge National Laboratory, USA
Issis Claudette Romero Ibarra, Instituto Politécnico Nacional, Mexico
Hector Siller, University of North Texas, USA
Sylvia Thomas, University of South Florida, USA
Javier Rodriguez Varela, Javier Rodriguez-Varela, Cinvestav Unidad Saltillo, Mexico
Volume 7 | Research snapshots from the 40th year of the Semiconductor Research Corporation
Victor Zhirnov, Semiconductor Research Corporation, USA
Volume 7 | Ion Implantation Technology
Larry Larson, Texas State University, USA
Susan Felch, Susan Felch Consulting, USA