MRS Advances - Volume 1 Editorial Board
Principle Editors
Guillermo Ameer, Northwestern University, USA
Mitchell Anstey, Sandia National Laboratories, USA
Haleh Ardebili, University of Houston, USA
David Armstrong, University of Oxford, UK
Jean-Charles Arnault, CEA LIST, France
Viktoriia Babicheva, Georgia State University, USA
Ningzhong Bao, Nanjing Tech University, China
Jason Bara, University of Alabama, USA
Katia Bertoldi, Harvard University, USA
Karlheinz Bock, TU Dresden, Germany
Paddy K.L. Chan, University of Hong Kong, Hong Kong
Ali Chirazi, FEI Application Software Group, France
Thomas Cooper, Air Force Research Laboratory, USA
Shadi Dayeh, University of California, San Diego, USA
Tao Deng, Shanghai Jiao Tong University, China
Chaitanya S. Deo, Georgia Institute of Technology, USA
Paola Deplano, University of Cagliari, Italy
Heifang Ding, Nanjing University, China
Chuanhua Duan, Boston University, USA
Paul Evans, University of Wisconsin-Madison, USA
Lan Fu, Australian National University, Australia
Jacek Furdyna, University of Notre Dame, USA
Sharon Gerecht, John Hopkins University, USA
Talia Gershon, IBM T. J. Watson Research Center, USA
David Ginley, National Renewable Energy Laboratory, USA
Alexander Govorov, Ohio University, USA
Ke Han, Florida State University, USA
Stephen Harris, Lawrence Berkeley National Laboratory, USA
Anita Ho-Baillie, The University of New South Wales, Australia
Sang Ho Oh, Pohang University of Science and Techology, South Korea
Yanglong Hou, Peking University, China
Hyunsang Hwang, Pohang University of Science and Techology, South Korea
Olindo Isabella, Delft University of Technology, The Netherlands
De-en Jiang, University of California, Riverside, USA
Zakya Kafafi, Lehigh University, USA
Wonmo Kang, U.S. Naval Research Laboratory, USA
Manish Keswani, University of Arizona, USA
Daniel Kiener, Montan Universityersität Leoben, Austria
Dae-Hyeong Kim, Seoul National University, South Korea
Takanobu Kiss, Kyushu University, Japan
Coskun Kocabas, Bilkent University, Turkey
Norbert Koch, Humboldt University, Germany
Marisol Koslowski, Purdue University, USA
Martin Kuball, University of Bristol, UK
Andreas Lendlein, Helmholtz-Zentrum Geesthacht GmbH, Germany
Darren Lipomi, University of California-San Diego, USA
Johan Liu, Chalmers University of Technology, Sweden
Li Liu, Rensselaer Polytechnic Institute, USA
Yang Yang Li, City University of Hong Kong, Hong Kong
Yat Li, University of California-Santa Cruz, USA
Alfred Ludwig, Ruhr University-Bochum, Germany
Enrique Martinez, Los Alamos National Laboratory, USA
Naoki Matsuda, National Institute of Advanced Industrial Science and Technology, Japan
Yurong Ma, Peking University, China
Martyn McLachlan, Imperial College London, UK
Al Meldrum, University of Alberta, Canada
Kash Mittal, Reviews of Adhesion and Adhesives, USA
Masaaki Nagatsu, Shizuoka University, Japan
Robert Nemanich, Arizona State University, USA
Dragomir Neshev, Australian National Universit, Australia
Paul Ohodnicki, National Energy Tech Laboratory, USA
Mariappan Parans Paranthaman, Oak Ridge National Laboratory, USA
Jang Ung Park, Ulsan National Institute of Science and Technology, South Korea
Julien Pernot, University of Grenoble Alpes, France
Ketul C. Popat, Colorado State University, USA
Nini Pryds, Technical University of Denmark, Denmark
Regina Ragan, University of California, USA
Sebastian Reineke, Technische Universität Dresden, Germany
Yuta Saito, National Institute of Advanced Industrial Science and Technology, Japan
Clara Santato, Ecole Polytechnique-Montreal, Canada
Michele Sessolo, University of Valencia, Spain
Yuyan Shao, Pacific Northwest National Laboratory, USA
Robert Sinclair, Stanford University, USA
Susan Sinnott, The Pennsylvania State University, USA
Nian Sun, Northeastern University, USA
Yugang Sun, Argonne National Laboratory, USA
Seiichi Takamatsu, National Institute of Advanced Industrial Science and Technology , Japan
Maria Tamargo, The City College of New York, USA
Chee Hing Tan, University of Sheffield, UK
Rita Toth, Empa, Switzerland
Peter Trefonas, Dow Electronic Materials, USA
Aurélien Vattré, CEA, France
Fred Walker, Yale University, USA
Thomas Walther, University of Sheffield, UK
Donghai Wang, The Pennsylvania State University, USA
Haidan Wen, Argonne National Laboratory, USA
Ashley White, Lawrence Berkeley National Laboratory, USA
Karl Whittle, University of Liverpool, UK
Ming Xu, Huazhong University of Science and Technology, China
Masashi Yamaguchi, Rensselaer Polytechnic Institute, USA
Yaroslava Yingling, North Carolina State University, USA
Carl-Mikael Zetterling, KTH Royal Institute of Technology, Sweden
Jie Zheng, University of Akron, USA
Jia Zhu, Nanjing University, China
Yuntian Zhu, North Carolina State University, USA
Volume 1|Scientific Basis for Nuclear Waste Management XXXIX
Nicolas Clavier, CNRS, France
Nicolas Dacheux, Université de Montpellier, France
Christophe Poinssot, CEA Marcoule, France