1. Depth scale calibration during sputter removal of multilayer systems by SNMS

   • A. Wucher
   • H. Oechsner

   OriginalPaper Pages: 470 - 473

2. On the role of ion bombardment parameters in AES sputter depth profiling of Ta₂O₅/Ta with Ar⁺ and Xe⁺

   • J. Scholtes
   • H. Oechsner

   OriginalPaper Pages: 474 - 477

3. Concentration profiles of hydrogen in technical oxidic thin films and multilayer systems

   • W. Wagner
   • F. Rauch
   • K. Bange

   OriginalPaper Pages: 478 - 480

4. Optical and electron spectroscopy of magneto-optical storage films

   • D. Weller
   • W. Reim

   OriginalPaper Pages: 481 - 484

5. SIMS investigations of titanium profiles in LiNbO₃ produced by ion beam mixing and diffusion

   • T. Bremer
   • D. Kollewe
   • W. Heiland

   OriginalPaper Pages: 485 - 487

6. Thickness measurement of thin dielectrics with electron spectroscopy

   • D. Roß
   • M. Maier

   OriginalPaper Pages: 488 - 491

7. High-resolution Auger electron spectroscopy of phase boundaries in TiC/TiB₂ materials

   • E. Nold
   • H. Holleck
   • H. Leiste

   OriginalPaper Pages: 492 - 497

8. Analysis of sputter deposited and evaporated tantalum oxide layers on SiO₂ by SNMS, XPS, TDS and TRFA

   • K. -H. Müller
   • V. Rupertus
   • T. Tschudi

   OriginalPaper Pages: 498 - 501

9. Comparative surface and bulk analysis of oxygen in Si₃N₄ powders

   • H. Jenett
   • H. Bubert
   • E. Grallath

   OriginalPaper Pages: 502 - 506

10. In situ ion implantation for quantification in secondary-ion mass spectrometry

    • H. Gnaser

    OriginalPaper Pages: 507 - 510

11. AES and SIMS profiling of buried silicide layers formed by 6 MeV high dose nickel implantation into silicon

    • A. Schönborn
    • J. K. N. Lindner
    • G. Friedbacher

    OriginalPaper Pages: 511 - 515

12. Characterization of semiconductor surfaces

    • J. A. Schaefer

    OriginalPaper Pages: 516 - 517

13. Dynamic examinations at photoresists by reflectance spectroscopy

    • G. Gauglitz
    • J. Krause-Bonte

    OriginalPaper Pages: 518 - 521

14. B-contamination of Si-surfaces

    • A. Casel
    • E. Sasse
    • H. Kibbel

    OriginalPaper Pages: 522 - 523

15. Surface analysis for Si-wafers using total reflection X-ray fluorescence analysis

    • W. Berneike
    • J. Knoth
    • U. Weisbrod

    OriginalPaper Pages: 524 - 526

16. Surface analytical characterization of oxide-free Si(100) wafer surfaces

    • L. Mühlhoff
    • T. Bolze

    OriginalPaper Pages: 527 - 530

17. Investigation of deep states in thin films of hydrogenated amorphous silicon by photo-induced current transient spectroscopy

    • J. Herion
    • M. Tapiero
    • W. Beyer

    OriginalPaper Pages: 531 - 534

18. ESCA, SIMS, SEM and XRD investigations of Pt-10%Rh catalyst-gauzes

    • A. P. v. Rosenstiel
    • W. H. J. Bruis
    • K. H. Berresheim

    OriginalPaper Pages: 535 - 539

19. XPS and ISS analysis of Fischer-Tropsch catalysts

    • U. Lindner
    • H. Papp

    OriginalPaper Pages: 540 - 544

20. Interaction between S-organic compounds and iron surfaces

    • M. Volmer
    • M. Stratmann
    • H. Viefhaus

    OriginalPaper Pages: 545 - 545

21. Surface analysis methods in the investigation of corrosion inhibitor performance

    • R. Holm
    • D. Holtkamp
    • S. Storp

    OriginalPaper Pages: 546 - 554

22. A CEMS/AES study of the passivation of iron

    • W. Meisel
    • U. Stumm
    • P. Gütlich

    OriginalPaper Pages: 555 - 560

23. Surface and thin film analysis in silicon technology: actual and future problems and demands

    • B. O. Kolbesen
    • W. Pamler

    OriginalPaper Pages: 561 - 568

24. Kinetics of titanium silicide formation by rapid thermal processing

    • W. Pamler
    • K. Wangemann
    • A. Mitwalsky

    OriginalPaper Pages: 569 - 575

25. Quantitative determination of oxygen in silicon by combination of FTIR-spectroscopy, inert gas fusion analysis and secondary ion mass spectroscopy

    • G. Stingeder
    • S. Gara
    • M. Grasserbauer

    OriginalPaper Pages: 576 - 582

26. Ion channeling analysis of buried epitaxial Co silicides

    • K. Kohlhof
    • S. Mantl
    • B. Stritzker

    OriginalPaper Pages: 583 - 585

27. Detection of metallic trace impurities on Si(100) surfaces with total reflection X-ray fluorescence (TXRF)

    • V. Penka
    • W. Hub

    OriginalPaper Pages: 586 - 589

28. A study of the adhesion of copper to polyimide foils using surface analytical techniques

    • K. Horn
    • A. M. Bradshaw
    • R. Schulz

    OriginalPaper Pages: 590 - 595

29. Surface analysis within the framework of The International Union of Pure and Applied Chemistry

    • W. H. Gries

    OriginalPaper Pages: 596 - 597

30. Neue Geräte und Chemikalien

    Announcement Pages: A11 - A12