1. Editorial

   • Wilhelm Fresenius
   • Ingo Lüderwald

   EditorialNotes Pages: A7 - A7

2. Introduction

   • Hans Oechsner

   EditorialNotes Pages: 1 - 2

3. On the use of single-photon ionization for inorganic surface analysis

   • C. H. Becker

   Part I Pages: 3 - 6

4. Saturation and fragmentation in non resonant laser postionization of sputtered atoms and molecules

   • K. Franzreb
   • A. Wucher
   • H. Oechsner

   Part I Pages: 7 - 11

5. The emission of secondary clusters and its relevance for analytical Laser-SNMS

   • W. Husinsky
   • P. Wurz
   • G. Betz

   Part I Pages: 12 - 16

6. Analysis of organic compounds with SNMS

   • H. -P. Ewinger
   • J. Goschnick
   • H. J. Ache

   Part I Pages: 17 - 19

7. SNMS studies of ULSI gate interconnection structures

   • L. Moro
   • P. Lazzeri
   • M. Anderle

   Part I Pages: 20 - 24

8. Interaction of Pd-overlayers with SnO₂: comparative XPS, SIMS, and SNMS studies

   • J. F. Geiger
   • P. Beckmann
   • W. Göpel

   Part I Pages: 25 - 30

9. Surface roughening during depth profiling by Secondary Ion Mass Spectrometry (SIMS) in GaAlAs and GaAs

   • M. Gericke
   • T. Lill
   • A. Hupfer

   Part I Pages: 31 - 34

10. Influence of the primary ion incidence angle on secondary ion emission in SIMS with nitric oxide as reactant gas

    • W. Seidel
    • W. Rybczynski
    • D. Thiel

    Part I Pages: 35 - 42

11. Angle-dependent SIMS artifact in the analysis of InP/InGaAs layers

    • I. Weitzel
    • W. Hösler
    • R. v. Criegern

    Part I Pages: 43 - 48

12. Dynamic range optimization in SIMS analyses of arsenic and antimony dopants in silicon

    • K. Wangemann
    • R. Lange-Gieseler

    Part I Pages: 49 - 53

13. SIMS depth profile analysis using MCs⁺ molecular ions

    • H. Gnaser
    • H. Oechsner

    Part I Pages: 54 - 56

14. Quadrupole mass spectrometer for residual gas analysis and SIMS application

    • Gy. Hárs
    • A. Sólyom
    • J. Giber

    Part I Pages: 57 - 59

15. Extended SIMS capabilities by sample preparation

    • R. v. Criegern
    • R. Lange-Gieseler
    • H. Zeininger

    Part I Pages: 60 - 65

16. Depth profile investigations of metallic layer contacts to GaAs(100) and InP(100) by means of Auger Electron Spectroscopy and sputter technique

    • S. Stein
    • A. Reif
    • H. Störi

    Part I Pages: 66 - 69

17. Evaluation of Auger Electron Spectroscopy (AES) depth-profiles by application of Factor Analysis

    • E. Oesterschulze
    • K. Maßeli
    • R. Kassing

    Part I Pages: 70 - 73

18. Electron Spectroscopy (ESCA) on technical oxidic thin films prepared by different methods

    • O. Anderson
    • K. Bange

    Part I Pages: 74 - 78

19. AES and CEMS analysis of the formation of layers on Si steel under thermal treatment in a flux of H₂/water vapour

    • T. Ternes
    • W. Meisel
    • P. Gütlich

    Part I Pages: 79 - 82

20. X-ray induced fluorescence spectrometry at grazing incidence for quantitative surface and layer analysis

    • U. Weisbrod
    • R. Gutschke
    • H. Schwenke

    Part I Pages: 83 - 86

21. Characterization of V₂O₅/SiO₂- and TiO₂/SiO₂-mixed gel catalysts by Raman spectroscopy

    • M. Schraml-Marth
    • A. Wokaun
    • A. Baiker

    Part I Pages: 87 - 91

22. In situ measurement of etch velocity of layers on silicon

    • H. Proksche
    • G. Nagorsen
    • D. Roß

    Part I Pages: 92 - 94

23. Optical reflection spectroscopy of mineral and ice surfaces in comet simulation experiments

    • E. Langenscheidt
    • K. Roessler

    Part I Pages: 95 - 100

24. Application of infrared luminescence microscopy for ion beam diagnostics and for measurement of ion dose densities from 10⁹ to 10¹⁶ cm⁻²

    • O. Hoinkis
    • K. Miethe
    • W. H. Gries

    Part I Pages: 101 - 105

25. Interface analysis for solid state electrochemical devices and chemical sensors

    • H. D. Wiemhöfer
    • W. Göpel

    Part I Pages: 106 - 111

26. Quantitative characterization of oxygen precipitates in CZ-silicon with secondary ion mass spectrometry

    • S. Gara
    • G. Stingeder
    • M. Grasserbauer

    Part I Pages: 112 - 115

27. Deconvolution of XPS spectra

    • D. Sprenger
    • O. Anderson

    Part I Pages: 116 - 120

28. A standard form of spectra for quantitative ESCA-analysis

    • K. Berresheim
    • M. Mattern-Klosson
    • M. Wilmers

    Part I Pages: 121 - 124

29. Bulk trace and distribution analysis in refractory and hard metals. examples from research and development and applications in quality assurance

    • Peter Wilhartitz
    • Hugo M. Ortner

    Part I Pages: 125 - 130

30. Surface phase analysis by conversion X-ray and conversion electron Mössbauer spectroscopy

    • Ulrich Gonser
    • Peter Schaaf

    Part I Pages: 131 - 135

31. Analysis of the surface of Pt_xNi_1−x alloys

    • P. Novacek
    • E. Taglauer
    • P. Varga

    Part I Pages: 136 - 139

32. Quantitative depth-profiling with GDOS: application to ZnNi-electrogalvanized steel sheets

    • J. Angeli
    • T. Kaltenbrunner
    • F. M. Androsch

    Part I Pages: 140 - 144

33. Investigations of the distribution of elements in phases present in G-AlMg₅Si cast alloy with EDX/WDX spectrometers and AES

    • Joze Pirs
    • Anton Zalar

    Part I Pages: 145 - 149

34. Investigation of the deuterium solubility in niobium using secondary ion mass spectrometry (SIMS)

    • Harald Züchner
    • Thomas Brüning

    Part I Pages: 150 - 153