Surface Engineering and Applied Electrochemistry
Surface Engineering and Applied Electrochemistry is a journal that publishes original and review articles on theory and applications of electroerosion and electrochemical methods for the treatment of materials; physical and chemical methods for the preparation of macro-, micro-, and nanomaterials and their properties; electrical processes in engineering, chemistry, and methods for the processing of biological products and food; and application electromagnetic fields in biological systems.
Surface Engineering and Applied Electrochemistry is a peer reviewed journal. We use a single blind or double blind peer review formats. Our team of reviewers includes 105 reviewers, both internal and external (93%), from 13 countries. The average period from submission to first decision in 2017 was 5 days, and that from first decision to acceptance was 30 days. The final decision on the acceptance of an article for publication is made by Peer Reviewers.
Any invited reviewer who feels unqualified or unable to review the manuscript due to the conflict of interests should promptly notify the editors and decline the invitation. Reviewers should formulate their statements clearly in a sound and reasoned way so that authors can use reviewer’s arguments to improve the manuscript. Personal criticism of the authors must be avoided. Reviewers should indicate in a review (i) any relevant published work that has not been cited by the authors, (ii) anything that has been reported in previous publications and not given appropriate reference or citation, (ii) any substantial similarity or overlap with any other manuscript (published or unpublished) of which they have personal knowledge.
Effect of Doubly Charged Ions in Forming the Mass Spectra of Solid-State Substances in a Mass Spectrometer with Inductively Coupled Plasma
T. K. Nurubeili (July 2018)
- Journal Title
- Surface Engineering and Applied Electrochemistry
- Volume 43 / 2007 - Volume 54 / 2018
- Print ISSN
- Online ISSN
- Pleiades Publishing
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