Recognizing the need for materials data: The missing link in process modeling Sulekh C. Jain Process Data and Modeling Pages: 6 - 7
Space: A unique environment for process modeling R&D Tony Overfelt Process Data and Modeling Pages: 8 - 11
European developments in simulating forming processes using three-dimensional finite-element analysis P. HartleyI. PillingerC. E. N. Sturgess Process Data and Modeling Pages: 12 - 14
A metallurgical expert system for interpreting FEA K. J. Meltsner Process Data and Modeling Pages: 15 - 17
An optical roughness sensor for real-time quality measurement Rochelle D. PayneAngela L. MoranPaul Kelley Process Data and Modeling Pages: 18 - 21
Progress in the low-temperature epitaxy of silicon and silicon-based heterostructures Martin L. Green Low-Temperature Silicon Epitaxy Pages: 22 - 22
The current status of commercial low-temperature silicon epitaxy John O. Borland Low-Temperature Silicon Epitaxy Pages: 23 - 27
Recent progress in silicon molecular-beam epitaxy H. -J. GossmannD. J. Eaglesham Low-Temperature Silicon Epitaxy Pages: 28 - 31
Ultrahigh-vacuum CVD Epitaxy of silicon and GexSi1−x Marco RacanelliDavid W. Greve Low-Temperature Silicon Epitaxy Pages: 32 - 37
The rapid thermal processing chemical vapor deposition of silicon epitaxial films K. H. JungT. Y. HsiehD. L. Kwong Low-Temperature Silicon Epitaxy Pages: 38 - 43
RTCVD growth and applications of epitaxial Si1−xGex alloys James C. Sturm Low-Temperature Silicon Epitaxy Pages: 44 - 47
Unit process modeling developments at the Edison Materials Technology Center L. L. MidoloE. F. Moore Forum Pages: 55 - 57
