Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques publishes original articles on the topical problems of solid-state physics, materials science, experimental techniques, condensed media, nanostructures, surfaces of thin films, and phase boundaries: geometric and energetical structures of surfaces, the methods of computer simulations; physical and chemical properties and their changes upon radiation and other treatments; the methods of studies of films and surface layers of crystals (XRD, XPS, synchrotron radiation, neutron and electron diffraction, electron microscopic, scanning tunneling microscopic, atomic force microscopic studies, and other methods that provide data on the surfaces and thin films). Articles related to the methods and technics of structure studies are the focus of the journal. The journal accepts manuscripts of regular articles and reviews in English or Russian language from authors of all countries. All manuscripts are peer-reviewed.
Journal of Surface Investigation is a peer reviewed journal. We use a single blind peer review format. Our team of reviewers includes over 30 reviewers, both internal and external (40%). The average period from submission to first decision in 2017 was 14 days, and that from first decision to acceptance was 30 days. The rejection rate for submitted manuscripts in 2017 was 10%. The final decision on the acceptance of an article for publication is made by the Editor-in-Chief or the Editorial Board.
Any invited reviewer who feels unqualified or unable to review the manuscript due to the conflict of interests should promptly notify the editors and decline the invitation. Reviewers should formulate their statements clearly in a sound and reasoned way so that authors can use reviewer’s arguments to improve the manuscript. Personal criticism of the authors must be avoided. Reviewers should indicate in a review (i) any relevant published work that has not been cited by the authors, (ii) anything that has been reported in previous publications and not given appropriate reference or citation, (ii) any substantial similarity or overlap with any other manuscript (published or unpublished) of which they have personal knowledge.
Study of the Influence of Implanted Atoms on the Coefficients of the Sputtering of Silicon and Silicon with a Thin Oxide Film
Development of Field Alignment Methods for Electron-Вeam Lithography in the Case of X-Ray Bragg–Fresnel Lenses
- Journal Title
- Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques
- Volume 1 / 2007 - Volume 12 / 2018
- Print ISSN
- Online ISSN
- Pleiades Publishing
- Additional Links
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