1. SEM Measurements of the Dimensions of Relief Structures in the Technological Process of Manufacturing Microcircuits

   • Yu. A. Novikov
   • M. N. Filippov

   OriginalPaper 20 June 2023 Pages: 35 - 42

   

2. Investigation of the Possibility of Optimizing the Interaction of NV Centers and Photons by Changing the Shape of Microresonators

   • A. V. Tsukanov
   • I. Yu. Kateev

   OriginalPaper 20 June 2023 Pages: 43 - 56

   

3. Cross Sections of Scattering Processes in Electron-Beam Lithography

   • A. E. Rogozhin
   • F. A. Sidorov

   OriginalPaper 20 June 2023 Pages: 57 - 73

   

4. Oxide Memristors for ReRAM: Approaches, Characteristics, and Structures

   • A. G. Isaev
   • O. O. Permyakova
   • A. E. Rogozhin

   OriginalPaper 20 June 2023 Pages: 74 - 98

   

5. Plasma Parameters and Kinetics of Reactive Ion Etching of SiO₂ and Si₃N₄ in an HBr/Cl₂/Ar Mixture

   • A. M. Efremov
   • V. B. Betelin
   • K.-H. Kwon

   OriginalPaper 20 June 2023 Pages: 99 - 106

   

6. Investigation of the Optical Properties of Ultrathin Films Based on Metal Silicide

   • E. A. Kerimov

   OriginalPaper 20 June 2023 Pages: 107 - 111

   

7. Influence of the Passivation Layers on the Self-Heating Effect in the Double Channel AlGaN/GaN MOS-HEMT Device

   • Maryam Shaveisi
   • Peiman Aliparast

   OriginalPaper 20 June 2023 Pages: 112 - 118

   

8. Design of Ternary Multiplier Using Pseudo NCNTFETs

   • S. V. Ratan Kumar
   • L. Koteswara Rao
   • M. Kiran Kumar

   OriginalPaper 20 June 2023 Pages: 119 - 127