Application of the Tikhonov Regularization Method in Problems of Ellipsometic Porometry of Low-K Dielectrics R. A. GaidukasovA. V. Myakon’kikhK. V. Rudenko OriginalPaper Open access 12 July 2022 Pages: 199 - 209
Application of the Methods Used to Interpret the Electron Spectroscopy Spectra to Interpret Ion Spectroscopy Signals V. P. AfanasievL. G. Lobanova OriginalPaper 12 July 2022 Pages: 210 - 219
Modeling Silicon Cylindrical CMOS Nanotransistors with a Fully Enclosed Variable-Radius Gate N. V. Masalsky OriginalPaper 12 July 2022 Pages: 220 - 225
Finite Element Modeling of Surface Acoustic Wave Devices Using COMSOL A. S. KoigerovA. V. Korlyakov OriginalPaper 12 July 2022 Pages: 226 - 235
Formation of Nanosized Structures on the Silicon Surface by a Combination of Focused Ion Beam Methods and Plasma-Chemical Etching V. S. KliminYu. V. MorozovaO. A. Ageev OriginalPaper 12 July 2022 Pages: 236 - 242
Plasma-Chemical and Reactive-Ion Etching of Silicon in Tetrafluoromethane with Argon D. B. MurinS. A. PivovarenokA. S. Kozin OriginalPaper 12 July 2022 Pages: 243 - 246
Plasma Parameters and Kinetics of Reactive-Ion Etching of Silicon in a C6F12O + Ar Mixture A. M. EfremovV. B. BetelinK.-H. Kwon OriginalPaper 12 July 2022 Pages: 247 - 254
A Mechanism for the Formation of a Conducting Medium in Memristers Based on Electroformed Open Sandwich MDM Structures V. M. MordvintsevE. S. GorlachevS. E. Kudryavtsev OriginalPaper 12 July 2022 Pages: 255 - 263
Analysis of the Effects Influencing the Retention Time of Filament-Based Memristors A. V. FadeevK. V. Rudenko OriginalPaper 12 July 2022 Pages: 264 - 272