In situ Diagnostics of Plasma Processes in Microelectronics: The Current Status and Prospects. Part II A. A. OrlikovskiiK. V. RudenkoYa. N. Sukhanov OriginalPaper 01 August 2014 Pages: 137 - 154
A Microwave High-Density Plasma Source for Submicron Silicon IC Technology S. N. AverkinK. A. ValievA. A. Rylov OriginalPaper 01 August 2014 Pages: 155 - 159
Microwave Plasmatrons for Fabrication of High-Density Integrated Circuits A. B. Petrin OriginalPaper 01 August 2014 Pages: 160 - 172
Superlarge Defects in CZ Si : B Single Crystals V. A. Yur'evV. P. Kalinushkin OriginalPaper 01 August 2014 Pages: 173 - 174
Electron Microscopy Study of Ferroelectric Memory Based on Si–SiO2–Ti–Pt–PZT Multilayer Structure O. M. ZhigalinaP. V. BurmistrovaA. S. Sigov OriginalPaper 01 August 2014 Pages: 175 - 186
Investigation of the Metal Deposited into Nanopores of Anodic Alumina upon Fabricating Substrates for Microelectronic Devices N. I. MukhurovI. F. KotovaV. A. Chubarenko OriginalPaper 01 August 2014 Pages: 187 - 190
Silicon Surface Cleaning by Wet Etching for IC Production in a Closed Manufacturing System Yu. P. Snitovskii OriginalPaper 01 August 2014 Pages: 191 - 194
A Microstrip Thin-Film Low-Field Magnetic Transducer B. A. BelyaevS. V. ButakovA. A. Leksikov OriginalPaper 01 August 2014 Pages: 195 - 202
Specific Features of the Current–Voltage Characteristics of p–nStructures with an Interfacial Layer in the Base Region B. S. Sokolovskii OriginalPaper 01 August 2014 Pages: 203 - 205