1. Radial distribution measurement of SiH^* in a low-pressure silane plasma

   • Yuichiro Asano
   • Douglas S. Baer
   • Ronald K. Hanson

   OriginalPaper Pages: 1 - 8

2. Plasma-deposited metal-containing polymer films

   • H. Suhr
   • A. Etspüler
   • C. Oehr

   OriginalPaper Pages: 9 - 17

3. Study of reactive ion etching of Si and SiO₂ for CF_xCl_4−x gases

   • Guadalupe Fortuño

   OriginalPaper Pages: 19 - 34

4. Langmuir probe characteristics in RF glow discharges

   • N. Hershkowitz
   • M. H. Cho
   • T. Intrator

   OriginalPaper Pages: 35 - 52

5. A comparison between RF-driven single and double cathode structures

   • R. W. Boswell
   • A. Bouchoule

   OriginalPaper Pages: 53 - 66

6. Use of solvents in the low-pressure plasma oxidation of olefins

   • H. Suhr
   • H. Pfreundschuh

   OriginalPaper Pages: 67 - 74

7. Probe measurements in thermal plasma jets

   • M. Brossa
   • E. Pfender

   OriginalPaper Pages: 75 - 90

8. Carburizing of titanium with plasma jets under reduced pressure

   • Toshiro Kotaki
   • Osamu Matsumoto

   OriginalPaper Pages: 91 - 100

9. Dynamics of the formation of excited hydrogen, H(n=2,3,4), during a pulse discharge in methane

   • Radoslaw Sobczynski
   • Hubert Lange
   • Stanislaw Kurowski

   OriginalPaper Pages: 101 - 110

10. Announcement

    Announcement Pages: 111 - 111