1. Attachment and ionization in a self-consistent treatment of the electron kinetics of a collision-dominated rf plasma

   • R. Winkler
   • M. Dilonardo
   • J. Wilhelm

   OriginalPaper Pages: 245 - 265

2. Influence of plasma excitation frequency fora-Si:H thin film deposition

   • H. Curtins
   • N. Wyrsch
   • A. V. Shah

   OriginalPaper Pages: 267 - 273

3. Thermochemistry of thermal plasma chemical reactions. Part I. General rules for the prediction of products

   • Yl Chang
   • E. Pfender

   OriginalPaper Pages: 275 - 297

4. Thermochemistry of thermal plasma chemical reactions. Part II. A survey of synthesis routes for silicon nitride production

   • Yl Chang
   • R. M. Young
   • E. Pfender

   OriginalPaper Pages: 299 - 316

5. Some perspectives on the modeling of plasma jets

   • A. H. Dilawari
   • J. Szekely

   OriginalPaper Pages: 317 - 339

6. Application of an atmospheric-pressure microwave plasma to the optical fiber manufacturing process

   • R. Bajorek
   • R. Parosa
   • S. Zbyrad

   OriginalPaper Pages: 341 - 348

7. The effect of low concentrations of a polyatomic gas in argon on erosion on copper cathodes in a magnetically rotated arc

   • R. N. Szente
   • R. J. Munz
   • M. G. Drouet

   OriginalPaper Pages: 349 - 364

8. Soft X-ray emission from a CO₂ laser-heated Z-pinch plasma

   • J. E. Tucker
   • R. M. Gilgenbach

   OriginalPaper Pages: 365 - 376

9. Announcement

   Announcement Pages: 377 - 377